TY - JOUR
T1 - Pseudoelastic Deformation during Nanoscale Adhesive Contact Formation
AU - Mordehai, Dan
AU - Rabkin, Eugen
AU - Srolovitz, David J.
PY - 2011/8/26
Y1 - 2011/8/26
N2 - Molecular dynamics simulations are employed to demonstrate that adhesive contact formation through classical jump to contact is mediated by extensive dislocation activity in metallic nanoparticles. The dislocations generated during jump to contact are completely annihilated by the completion of the adhesive contact, leaving the nanoparticles dislocation-free. This rapid and efficient jump to contact process is pseudoelastic, rather than purely elastic or plastic.
AB - Molecular dynamics simulations are employed to demonstrate that adhesive contact formation through classical jump to contact is mediated by extensive dislocation activity in metallic nanoparticles. The dislocations generated during jump to contact are completely annihilated by the completion of the adhesive contact, leaving the nanoparticles dislocation-free. This rapid and efficient jump to contact process is pseudoelastic, rather than purely elastic or plastic.
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U2 - 10.1103/PhysRevLett.107.096101
DO - 10.1103/PhysRevLett.107.096101
M3 - RGC 21 - Publication in refereed journal
SN - 0031-9007
VL - 107
JO - Physical Review Letters
JF - Physical Review Letters
IS - 9
M1 - 096101
ER -