Principles and characteristics of a new generation plasma immersion ion implanter

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

Detail(s)

Original languageEnglish
Pages (from-to)1866-1874
Journal / PublicationReview of Scientific Instruments
Volume68
Issue number4
Publication statusPublished - Apr 1997

Abstract

A new generation multipurpose plasma immersion ion implanter (PIII) was custom designed, constructed, and installed in the City University of Hong Kong. The system is designed for general R&D applications in metallurgy, tribology, surface modification, and fabrication of novel materials. Using the new rf ion source in conjunction with the internal antenna system, the plasma density achieves excellent uniformity both laterally and axially. The system also incorporates two metal sources, including four metal arc sources and a sputtering electrode, so that multiple metal deposition and implantation steps can be performed in succession in the same equipment without exposing the samples to air. This capability can be critical to the study of surface properties and corrosion resistance. This article describes the design objectives, the novel features, and the characteristics of this new generation PIII equipment. © 1997 American Institute of Physics.

Citation Format(s)

Principles and characteristics of a new generation plasma immersion ion implanter. / Chu, P. K.; Tang, B. Y.; Cheng, Y. C.; Ko, P. K.

In: Review of Scientific Instruments, Vol. 68, No. 4, 04.1997, p. 1866-1874.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review