Prediction of surface passivation doping of silicon nanowires with phosphorus

X. B. Yang, C. S. Guo, R. Q. Zhang

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

12 Citations (Scopus)

Abstract

We report a prediction of enhanced surface passivation doping effect in silicon nanowires (SiNWs) by phosphorus adsorption based on first-principles calculations. Recent theoretical and experimental studies all showed that hydrogen-passivated SiNWs present typical p -type characteristic due to charge transfer between the surface passivant and the SiNW core. Here, we show that a phosphorus-passivated SiNW with a moderate diameter facilitates improved hole generation in the core and efficient separation of electron and hole, which may provide a practical avenue for fabricating low cost solar cells with high efficiency. © 2009 American Institute of Physics.
Original languageEnglish
Article number193105
JournalApplied Physics Letters
Volume95
Issue number19
DOIs
Publication statusPublished - 2009

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