Post-Implant Anneal: Fundamental Differences in Dopant Diffusion and Activation due to Rapid Thermal Annealing / Furnace Annealing

P. S. Choi; T. Su; R. D. Chang; P. K.  Chu; D. L. Kwong

Post-Implant Anneal: Fundamental Differences in Dopant Diffusion and Activation due to Rapid Thermal Annealing / Furnace Annealing

P. S. Choi, T. Su, R. D. Chang, P. K. Chu, D. L. Kwong

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

Abstract

A comparative study to determine if fundamental differences in ion-implanted dopant diffusion and activation between furnace annealing (FA) and rapid thermal annealing (RTA) has been initiated. A direct comparison between FA/RTA samples is possible through our ability to accurately determine the annealing time-Temperature (t-T) profile of both furnace and rapid thermally annealed samples. Results indicate that a comparison of the two annealing methods under identical time-Temperature profiles for a variety annealing conditions leads to distinctive differences in dopant activation and diffusion for a variety of implanted dopant species.

Original language	English
Title of host publication	MEETING ABSTRACTS
Pages	441-442
Volume	96-1
Publication status	Published - 1996
Event	189th Electrochemical Society Meeting - Los Angeles, United States Duration: 5 May 1996 → 10 May 1996

Conference

Conference	189th Electrochemical Society Meeting
Country/Territory	United States
City	Los Angeles
Period	5/05/96 → 10/05/96

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@inproceedings{fd1e5ed8c2ca4ffe91b840e77b125d63,

title = "Post-Implant Anneal: Fundamental Differences in Dopant Diffusion and Activation due to Rapid Thermal Annealing / Furnace Annealing",

abstract = "A comparative study to determine if fundamental differences in ion-implanted dopant diffusion and activation between furnace annealing (FA) and rapid thermal annealing (RTA) has been initiated. A direct comparison between FA/RTA samples is possible through our ability to accurately determine the annealing time-Temperature (t-T) profile of both furnace and rapid thermally annealed samples. Results indicate that a comparison of the two annealing methods under identical time-Temperature profiles for a variety annealing conditions leads to distinctive differences in dopant activation and diffusion for a variety of implanted dopant species.",

author = "Choi, {P. S.} and T. Su and Chang, {R. D.} and Chu, {P. K.} and Kwong, {D. L.}",

year = "1996",

language = "English",

volume = "96-1",

pages = "441--442",

booktitle = "MEETING ABSTRACTS",

note = "189th Electrochemical Society Meeting ; Conference date: 05-05-1996 Through 10-05-1996",

}

Post-Implant Anneal: Fundamental Differences in Dopant Diffusion and Activation due to Rapid Thermal Annealing / Furnace Annealing. / Choi, P. S.; Su, T.; Chang, R. D. et al.
MEETING ABSTRACTS. Vol. 96-1 1996. p. 441-442.

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

TY - GEN

T1 - Post-Implant Anneal

T2 - 189th Electrochemical Society Meeting

AU - Choi, P. S.

AU - Su, T.

AU - Chang, R. D.

AU - Chu, P. K.

AU - Kwong, D. L.

PY - 1996

Y1 - 1996

N2 - A comparative study to determine if fundamental differences in ion-implanted dopant diffusion and activation between furnace annealing (FA) and rapid thermal annealing (RTA) has been initiated. A direct comparison between FA/RTA samples is possible through our ability to accurately determine the annealing time-Temperature (t-T) profile of both furnace and rapid thermally annealed samples. Results indicate that a comparison of the two annealing methods under identical time-Temperature profiles for a variety annealing conditions leads to distinctive differences in dopant activation and diffusion for a variety of implanted dopant species.

AB - A comparative study to determine if fundamental differences in ion-implanted dopant diffusion and activation between furnace annealing (FA) and rapid thermal annealing (RTA) has been initiated. A direct comparison between FA/RTA samples is possible through our ability to accurately determine the annealing time-Temperature (t-T) profile of both furnace and rapid thermally annealed samples. Results indicate that a comparison of the two annealing methods under identical time-Temperature profiles for a variety annealing conditions leads to distinctive differences in dopant activation and diffusion for a variety of implanted dopant species.

M3 - RGC 32 - Refereed conference paper (with host publication)

VL - 96-1

SP - 441

EP - 442

BT - MEETING ABSTRACTS

Y2 - 5 May 1996 through 10 May 1996

ER -

Post-Implant Anneal: Fundamental Differences in Dopant Diffusion and Activation due to Rapid Thermal Annealing / Furnace Annealing

Abstract

Conference

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