Polymer-confined colloidal monolayer: A reusable soft photomask for rapid wafer-scale nanopatterning

Ming Fang; Hao Lin; Ho-Yuen Cheung; Fei Xiu; Lifan Shen; SenPo Yip; Edwin Yue-Bun Pun; Chun-Yuen Wong; Johnny C. Ho

doi:10.1021/am505221g

Polymer-confined colloidal monolayer: A reusable soft photomask for rapid wafer-scale nanopatterning

Ming Fang, Hao Lin, Ho-Yuen Cheung, Fei Xiu, Lifan Shen, SenPo Yip, Edwin Yue-Bun Pun, Chun-Yuen Wong, Johnny C. Ho^*

^*Corresponding author for this work

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

24 Citations (Scopus)

Abstract

We demonstrate the repeated utilization of self-Assembled colloidal spheres for rapid nanopattern generations. Highly ordered micro-/nanosphere arrays were interlinked and confined by a soft transparent polymer (polydimethylsiloxane, PDMS), which can be used as light-focusing elements/photomasks for area-selective exposures of photoresist in contact. Because of the stiffness of the colloidal spheres, the photomasks do not encounter feature-deformation problems, enabling reliable production of highly uniform patterns over large areas. The geometrical feature of the patterns, including the size, pitch, and even the shape, can be finely tuned by adjusting the mask design and exposure time. The obtained patterns could be used as deposition or etching mask, allowing easy pattern transfer for various applications.

Original language	English
Pages (from-to)	20837-20841
Journal	ACS Applied Materials and Interfaces
Volume	6
Issue number	23
Online published	6 Nov 2014
DOIs	https://doi.org/10.1021/am505221g
Publication status	Published - 10 Dec 2014

Research Keywords

colloidal monolayer
nanopatterning
reusable
soft photomask
wafer scale

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@article{cd789fa6786d4042b0421e93afeb1575,

title = "Polymer-confined colloidal monolayer: A reusable soft photomask for rapid wafer-scale nanopatterning",

abstract = "We demonstrate the repeated utilization of self-Assembled colloidal spheres for rapid nanopattern generations. Highly ordered micro-/nanosphere arrays were interlinked and confined by a soft transparent polymer (polydimethylsiloxane, PDMS), which can be used as light-focusing elements/photomasks for area-selective exposures of photoresist in contact. Because of the stiffness of the colloidal spheres, the photomasks do not encounter feature-deformation problems, enabling reliable production of highly uniform patterns over large areas. The geometrical feature of the patterns, including the size, pitch, and even the shape, can be finely tuned by adjusting the mask design and exposure time. The obtained patterns could be used as deposition or etching mask, allowing easy pattern transfer for various applications.",

keywords = "colloidal monolayer, nanopatterning, reusable, soft photomask, wafer scale",

author = "Ming Fang and Hao Lin and Ho-Yuen Cheung and Fei Xiu and Lifan Shen and SenPo Yip and Pun, {Edwin Yue-Bun} and Chun-Yuen Wong and Ho, {Johnny C.}",

year = "2014",

month = dec,

day = "10",

doi = "10.1021/am505221g",

language = "English",

volume = "6",

pages = "20837--20841",

journal = "ACS Applied Materials and Interfaces",

issn = "1944-8244",

publisher = "American Chemical Society",

number = "23",

}

TY - JOUR

T1 - Polymer-confined colloidal monolayer

T2 - A reusable soft photomask for rapid wafer-scale nanopatterning

AU - Fang, Ming

AU - Lin, Hao

AU - Cheung, Ho-Yuen

AU - Xiu, Fei

AU - Shen, Lifan

AU - Yip, SenPo

AU - Pun, Edwin Yue-Bun

AU - Wong, Chun-Yuen

AU - Ho, Johnny C.

PY - 2014/12/10

Y1 - 2014/12/10

N2 - We demonstrate the repeated utilization of self-Assembled colloidal spheres for rapid nanopattern generations. Highly ordered micro-/nanosphere arrays were interlinked and confined by a soft transparent polymer (polydimethylsiloxane, PDMS), which can be used as light-focusing elements/photomasks for area-selective exposures of photoresist in contact. Because of the stiffness of the colloidal spheres, the photomasks do not encounter feature-deformation problems, enabling reliable production of highly uniform patterns over large areas. The geometrical feature of the patterns, including the size, pitch, and even the shape, can be finely tuned by adjusting the mask design and exposure time. The obtained patterns could be used as deposition or etching mask, allowing easy pattern transfer for various applications.

AB - We demonstrate the repeated utilization of self-Assembled colloidal spheres for rapid nanopattern generations. Highly ordered micro-/nanosphere arrays were interlinked and confined by a soft transparent polymer (polydimethylsiloxane, PDMS), which can be used as light-focusing elements/photomasks for area-selective exposures of photoresist in contact. Because of the stiffness of the colloidal spheres, the photomasks do not encounter feature-deformation problems, enabling reliable production of highly uniform patterns over large areas. The geometrical feature of the patterns, including the size, pitch, and even the shape, can be finely tuned by adjusting the mask design and exposure time. The obtained patterns could be used as deposition or etching mask, allowing easy pattern transfer for various applications.

KW - colloidal monolayer

KW - nanopatterning

KW - reusable

KW - soft photomask

KW - wafer scale

UR - http://www.scopus.com/inward/record.url?scp=84917690511&partnerID=8YFLogxK

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-84917690511&origin=recordpage

U2 - 10.1021/am505221g

DO - 10.1021/am505221g

M3 - RGC 21 - Publication in refereed journal

SN - 1944-8244

VL - 6

SP - 20837

EP - 20841

JO - ACS Applied Materials and Interfaces

JF - ACS Applied Materials and Interfaces

IS - 23

ER -

Polymer-confined colloidal monolayer: A reusable soft photomask for rapid wafer-scale nanopatterning

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ECS: High-Performance Wrap-Gated III-V Nanowire Parallel Array MOSFETs on Silicon

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Polymer-confined colloidal monolayer: A reusable soft photomask for rapid wafer-scale nanopatterning

Abstract

Research Keywords

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ECS: High-Performance Wrap-Gated III-V Nanowire Parallel Array MOSFETs on Silicon

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