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Polarization-insensitive, shallow Ti-diffused near-stoichiometric LiTaO3 strip waveguide for integrated optics

  • Xiao-Fei YANG
  • , Zi-Bo ZHANG
  • , Wan-Ying DU
  • , Qun ZHANG
  • , Wing-Han WONG
  • , Dao-Yin YU
  • , Edwin Yue-Bun PUN
  • , De-Long ZHANG*
  • *Corresponding author for this work

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

Abstract

We report on a Ti-diffused near-stoichiometric (NS) LiTaO3 strip waveguide fabricated by diffusion of an 8 μm wide, 160 nm thick Ti-strip followed by Li-rich vapor transport equilibration. It is found that the waveguide surface caves in ∼60 nm below the crystal surface. X-ray single-crystal diffraction shows that the indentation is due to Ti-induced lattice contraction. Optical studies show that the waveguide is in an NS composition environment, supports TE and TM single-mode propagation at 1.5 μm wavelength, is polarization insensitive, and has a shallow mode field profile and a loss of 0.2/0.3 dB/cm for the TE/TM mode. Secondary ion mass spectrometry analysis shows that the Ti profile follows a sum of two error functions in the width direction and a Gaussian function in the depth direction of the waveguide. With the optimized fabrication condition, the waveguide is promising for developing an optical-damage-resistant device that requires a shallow mode field profile. © 2016 OpticalSociety of America.
Original languageEnglish
Pages (from-to)2513-2516
JournalOptics Letters
Volume41
Issue number11
Online published23 May 2016
DOIs
Publication statusPublished - 1 Jun 2016

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