Plasma-implanted Ti-doped hematite photoanodes with enhanced photoelectrochemical water oxidation performance

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • Fanxu Meng
  • Chung-Yu Guan
  • Shella Permatasari Santoso
  • Xingli Zou
  • Edward T. Yu

Detail(s)

Original languageEnglish
Article number159376
Journal / PublicationJournal of Alloys and Compounds
Volume870
Online published6 Mar 2021
Publication statusPublished - 25 Jul 2021

Abstract

Hematite (α-Fe2O3) is recognized as a promising photoelectrode material for photoelectrochemical (PEC) water splitting, as a result of its abundance, non-toxicity, suitable bandgap, and photochemical stability. Nevertheless, the undesirable physical and photophysical behaviors, such as poor conductivity, short diffusion length, and rapid charge-carrier recombination, seriously restrict PEC water splitting efficiency of hematite semiconductors. Herein, we fabricate nanoporous titanium (Ti)-doped α-Fe2O3 thin films by a facile hydrothermal reaction, subsequently utilizing energetic plasma ion implantation with a post-annealing process to significantly enhance the photoelectrochemical water oxidation performance of hematite. On the basis of materials characterization and electrochemical analysis, the optimized Ti-doped Fe2O3, i.e., Ti-4-Fe2O3, exhibits improved photocurrents of 0.55 and 1.07 mA cm−2 at 1.23 and 1.5 V versus RHE respectively under illumination of 100 mW/cm2 with AM 1.5 G spectrum, showing approximately 1.6-fold increases compared to pristine Fe2O3. We attribute this increase to improved charge carrier transport induced by Ti doping that reduces the recombination of light-driven charge carriers. The work utilizing plasma-assisted doping technique provides new insights into the surface engineering of photo-responsive semiconductors for the development of emerging hydrogen technologies.

Research Area(s)

  • Hematite, Photoelectrochemistry, Plasma ion implantation, Surface engineering

Citation Format(s)

Plasma-implanted Ti-doped hematite photoanodes with enhanced photoelectrochemical water oxidation performance. / Peng, Yong; Ruan, Qingdong; Lam, Chun Ho; Meng, Fanxu; Guan, Chung-Yu; Santoso, Shella Permatasari; Zou, Xingli; Yu, Edward T.; Chu, Paul K.; Hsu, Hsien-Yi.

In: Journal of Alloys and Compounds, Vol. 870, 159376, 25.07.2021.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review