Plasma-immersion ion implantation of the interior surface of a small cylindrical bore using an auxiliary electrode for finite rise-time voltage pulses

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • Xuchu Zeng
  • Tat-Kun Kwok
  • Aiguo Liu
  • Baoyin Tang
  • Terrence E. Sheridan

Detail(s)

Original languageEnglish
Pages (from-to)175-180
Journal / PublicationIEEE Transactions on Plasma Science
Volume26
Issue number2
Publication statusPublished - 1998

Abstract

Plasma-immersion ion implantation (PHI) can be used to process the interior surfaces of odd-shape specimens such as a cylindrical bore. The temporal evolution of the plasma sheath in a small cylindrical bore in the presence of a grounded coaxial auxiliary electrode is derived for voltage pulses of different rise times by solving Poisson's equation and the equations of ion continuity, and motion numerically using the appropriate boundary conditions. It is found that the maximum ion impact energy and the average impact energy are improved for finite rise-time voltage pulses, and shorter rise times yield better results. Our results allow the selection of a suitable auxiliary electrode radius to improve the average impact energy for a given rise time. © 1998 IEEE.

Research Area(s)

  • Ion implantation, Plasma applications, Plasma sheath

Citation Format(s)

Plasma-immersion ion implantation of the interior surface of a small cylindrical bore using an auxiliary electrode for finite rise-time voltage pulses. / Zeng, Xuchu; Kwok, Tat-Kun; Liu, Aiguo; Chu, Paul K.; Tang, Baoyin; Sheridan, Terrence E.

In: IEEE Transactions on Plasma Science, Vol. 26, No. 2, 1998, p. 175-180.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review