Plasma-immersion ion implantation of the interior surface of a small cylindrical bore using an auxiliary electrode for finite rise-time voltage pulses

Xuchu Zeng; Tat-Kun Kwok; Aiguo Liu; Paul K. Chu; Baoyin Tang; Terrence E. Sheridan

doi:10.1109/27.669623

Author(s)

Xuchu Zeng
Tat-Kun Kwok
Aiguo Liu
Baoyin Tang
Terrence E. Sheridan

Detail(s)

Original language	English
Pages (from-to)	175-180
Journal / Publication	IEEE Transactions on Plasma Science
Volume	26
Issue number	2
Publication status	Published - 1998

Link(s)

DOI	DOI https://doi.org/10.1109/27.669623 Final Published version
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Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-0032046865&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(8e4d7b95-9568-42c2-b158-1449aa950748).html

Abstract

Plasma-immersion ion implantation (PHI) can be used to process the interior surfaces of odd-shape specimens such as a cylindrical bore. The temporal evolution of the plasma sheath in a small cylindrical bore in the presence of a grounded coaxial auxiliary electrode is derived for voltage pulses of different rise times by solving Poisson's equation and the equations of ion continuity, and motion numerically using the appropriate boundary conditions. It is found that the maximum ion impact energy and the average impact energy are improved for finite rise-time voltage pulses, and shorter rise times yield better results. Our results allow the selection of a suitable auxiliary electrode radius to improve the average impact energy for a given rise time. © 1998 IEEE.