Plasma-nitrided high-k polycrystalline nano-array induced by electron irradiation

A. P. Huang; L. Wang; J. B. Xu; Paul K. Chu

doi:10.1088/0957-4484/17/17/015

Plasma-nitrided high-k polycrystalline nano-array induced by electron irradiation

A. P. Huang, L. Wang, J. B. Xu, Paul K. Chu

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

5 Citations (Scopus)

Abstract

The microstructure of plasma-nitrided high-k ZrO₂ thin films is found to continuously transform and larger size nano-crystals are formed during electron bombardment. Real-time high-resolution transmission electron microscopy (HRTEM) studies show that the plasma-nitrided nano-size particles can self-crystallize and regrow, whereas this phenomenon is not observed in amorphous ZrO₂ without N incorporation. Similar results are observed in plasma-nitrided HfO₂ samples and fine-scale polycrystalline nano-arrays are obtained by electron irradiation. Our results show that incorporation of N is crucial for inducing microstructural evolution as well as polycrystalline nano-array formation in high-k oxide under electron irradiation. © IOP Publishing Ltd.

Original language	English
Article number	15
Pages (from-to)	4379-4383
Journal	Nanotechnology
Volume	17
Issue number	17
DOIs	https://doi.org/10.1088/0957-4484/17/17/015
Publication status	Published - 1 Aug 2006

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@article{82047981b9094a54b74783a303f38789,

title = "Plasma-nitrided high-k polycrystalline nano-array induced by electron irradiation",

abstract = "The microstructure of plasma-nitrided high-k ZrO2 thin films is found to continuously transform and larger size nano-crystals are formed during electron bombardment. Real-time high-resolution transmission electron microscopy (HRTEM) studies show that the plasma-nitrided nano-size particles can self-crystallize and regrow, whereas this phenomenon is not observed in amorphous ZrO2 without N incorporation. Similar results are observed in plasma-nitrided HfO2 samples and fine-scale polycrystalline nano-arrays are obtained by electron irradiation. Our results show that incorporation of N is crucial for inducing microstructural evolution as well as polycrystalline nano-array formation in high-k oxide under electron irradiation. {\textcopyright} IOP Publishing Ltd.",

author = "Huang, {A. P.} and L. Wang and Xu, {J. B.} and Chu, {Paul K.}",

year = "2006",

month = aug,

day = "1",

doi = "10.1088/0957-4484/17/17/015",

language = "English",

volume = "17",

pages = "4379--4383",

journal = "Nanotechnology",

issn = "0957-4484",

publisher = "IOP Publishing",

number = "17",

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TY - JOUR

T1 - Plasma-nitrided high-k polycrystalline nano-array induced by electron irradiation

AU - Huang, A. P.

AU - Wang, L.

AU - Xu, J. B.

AU - Chu, Paul K.

PY - 2006/8/1

Y1 - 2006/8/1

N2 - The microstructure of plasma-nitrided high-k ZrO2 thin films is found to continuously transform and larger size nano-crystals are formed during electron bombardment. Real-time high-resolution transmission electron microscopy (HRTEM) studies show that the plasma-nitrided nano-size particles can self-crystallize and regrow, whereas this phenomenon is not observed in amorphous ZrO2 without N incorporation. Similar results are observed in plasma-nitrided HfO2 samples and fine-scale polycrystalline nano-arrays are obtained by electron irradiation. Our results show that incorporation of N is crucial for inducing microstructural evolution as well as polycrystalline nano-array formation in high-k oxide under electron irradiation. © IOP Publishing Ltd.

AB - The microstructure of plasma-nitrided high-k ZrO2 thin films is found to continuously transform and larger size nano-crystals are formed during electron bombardment. Real-time high-resolution transmission electron microscopy (HRTEM) studies show that the plasma-nitrided nano-size particles can self-crystallize and regrow, whereas this phenomenon is not observed in amorphous ZrO2 without N incorporation. Similar results are observed in plasma-nitrided HfO2 samples and fine-scale polycrystalline nano-arrays are obtained by electron irradiation. Our results show that incorporation of N is crucial for inducing microstructural evolution as well as polycrystalline nano-array formation in high-k oxide under electron irradiation. © IOP Publishing Ltd.

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UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-33947595139&origin=recordpage

U2 - 10.1088/0957-4484/17/17/015

DO - 10.1088/0957-4484/17/17/015

M3 - RGC 21 - Publication in refereed journal

SN - 0957-4484

VL - 17

SP - 4379

EP - 4383

JO - Nanotechnology

JF - Nanotechnology

IS - 17

M1 - 15

ER -

Plasma-nitrided high-k polycrystalline nano-array induced by electron irradiation

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