Plasma Implantation of Inner Wall of Cylindrical Insulating Tube

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)22_Publication in policy or professional journal

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Author(s)

  • X. B. Tian
  • J. C. Yan
  • S. Q. Yang
  • R. K Y Fu
  • P. K. Chu

Detail(s)

Original languageEnglish
Journal / PublicationIEEE International Conference on Plasma Science
Publication statusPublished - 2003

Conference

Title2003 IEEE International Conference on Plasma Science
PlaceKorea, Republic of
CityJeju
Period2 - 5 June 2003

Abstract

Plasma immersion ion implantation (PHI) is an effective technique to optimize surface propeities of materials and industrial components. Traditional applications are in the metallurgical and semiconductor fields but there has been increasing interest to process insulating materials such as polymers, ceramics, and biomedical materials and components. PIII of insulators is difficult due to the biasing mechanism. Our previous investigation has shown that the capacitance effect renders the process feasible if the insulating film is not thick. In this work, we conduct numerical investigation on the plasma implantation of the inner walls of insulating cylindrical tubes- Our work focuses on the effects of the thickness of the insulating wall, inner diameter, distance between the negatively biased auxiliary electrode and the tube, and other factors.

Citation Format(s)

Plasma Implantation of Inner Wall of Cylindrical Insulating Tube. / Tian, X. B.; Yan, J. C.; Yang, S. Q.; Fu, R. K Y; Chu, P. K.

In: IEEE International Conference on Plasma Science, 2003.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)22_Publication in policy or professional journal