Plasma Implantation of Inner Wall of Cylindrical Insulating Tube

Plasma immersion ion implantation (PHI) is an effective technique to optimize surface propeities of materials and industrial components. Traditional applications are in the metallurgical and semiconductor fields but there has been increasing interest to process insulating materials such as polymers, ceramics, and biomedical materials and components. PIII of insulators is difficult due to the biasing mechanism. Our previous investigation has shown that the capacitance effect renders the process feasible if the insulating film is not thick. In this work, we conduct numerical investigation on the plasma implantation of the inner walls of insulating cylindrical tubes- Our work focuses on the effects of the thickness of the insulating wall, inner diameter, distance between the negatively biased auxiliary electrode and the tube, and other factors.