Plasma-Based Technology in Microelectronics and Biomedical Engineering

Plasma-based ion implantation and deposition (PBII&D) is a useful technique in many applications. In addition to the ability to modify materials surfaces, novel structures can be fabricated. Another advantage is that the surface characteristics such as mechanical properties and biocompatibility can be selectively enhanced with the favorable bulk attributes of the materials unchanged. In this talk, recent research works conducted in our laboratory pertaining to microelectronics and biomedical engineering will be described. Topics to be presented include fabrication of novel silicon-on-insulator (SOI) materials using layer transfer and plasma technologies, synthesis and plasma treatment high-k thin films used in microelectronics. and surface modification of various types of biomedical components and materials.