Photorefractive-damage-resistant locally ErMg-doped near-stoichiometric Ti:Mg:Er:LiNbO3 strip waveguides: A way towards new devices

Ping-Rang Hua; De-Long Zhang; Edwin Yue-Bun Pun

doi:10.1109/LPT.2010.2048705

Photorefractive-damage-resistant locally ErMg-doped near-stoichiometric Ti:Mg:Er:LiNbO₃ strip waveguides: A way towards new devices

Ping-Rang Hua, De-Long Zhang, Edwin Yue-Bun Pun

Department of Electrical Engineering

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

15 Citations (Scopus)

Abstract

We report photorefractive-damage-resistant near-stoichiometric (NS) Ti:Mg:Er:LiNbO₃ strip waveguides fabricated on an initially congruent, undoped Z-cut substrate in sequence by local Er-doping in air, MgTi prediffusion in wet O₂ atmosphere, and post vapor-transport- equilibration. These waveguides with an initial Ti-strip width of 4-7 μm are single-mode at 1.3-1.5 μm, support only transverse-magnetic mode, and have a loss of 1.4 dB/cm. The waveguides are NS, still retain LiNbO₃ phase, and show stable 1531-nm small-signal enhancement under the 980-nm pump power of at least 216 mW, implying that the photorefractive effect is effectively suppressed. The waveguides would open up a way towards new devices. © 2006 IEEE.

Original language	English
Article number	5458072
Pages (from-to)	1008-1010
Journal	IEEE Photonics Technology Letters
Volume	22
Issue number	13
DOIs	https://doi.org/10.1109/LPT.2010.2048705
Publication status	Published - 2010

Research Keywords

Antiphotorefraction
local Er-Mg-codoping
near-stoichiometric (NS) Ti:Mg:Er:LiNbO3 waveguide

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title = "Photorefractive-damage-resistant locally ErMg-doped near-stoichiometric Ti:Mg:Er:LiNbO3 strip waveguides: A way towards new devices",

abstract = "We report photorefractive-damage-resistant near-stoichiometric (NS) Ti:Mg:Er:LiNbO3 strip waveguides fabricated on an initially congruent, undoped Z-cut substrate in sequence by local Er-doping in air, MgTi prediffusion in wet O2 atmosphere, and post vapor-transport- equilibration. These waveguides with an initial Ti-strip width of 4-7 μm are single-mode at 1.3-1.5 μm, support only transverse-magnetic mode, and have a loss of 1.4 dB/cm. The waveguides are NS, still retain LiNbO3 phase, and show stable 1531-nm small-signal enhancement under the 980-nm pump power of at least 216 mW, implying that the photorefractive effect is effectively suppressed. The waveguides would open up a way towards new devices. {\textcopyright} 2006 IEEE.",

keywords = "Antiphotorefraction, local Er-Mg-codoping, near-stoichiometric (NS) Ti:Mg:Er:LiNbO3 waveguide",

author = "Ping-Rang Hua and De-Long Zhang and Pun, {Edwin Yue-Bun}",

year = "2010",

doi = "10.1109/LPT.2010.2048705",

language = "English",

volume = "22",

pages = "1008--1010",

journal = "IEEE Photonics Technology Letters",

issn = "1041-1135",

publisher = "IEEE",

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}

Photorefractive-damage-resistant locally ErMg-doped near-stoichiometric Ti:Mg:Er:LiNbO₃ strip waveguides: A way towards new devices. / Hua, Ping-Rang; Zhang, De-Long; Pun, Edwin Yue-Bun.
In: IEEE Photonics Technology Letters, Vol. 22, No. 13, 5458072, 2010, p. 1008-1010.

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

TY - JOUR

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T2 - A way towards new devices

AU - Hua, Ping-Rang

AU - Zhang, De-Long

AU - Pun, Edwin Yue-Bun

PY - 2010

Y1 - 2010

N2 - We report photorefractive-damage-resistant near-stoichiometric (NS) Ti:Mg:Er:LiNbO3 strip waveguides fabricated on an initially congruent, undoped Z-cut substrate in sequence by local Er-doping in air, MgTi prediffusion in wet O2 atmosphere, and post vapor-transport- equilibration. These waveguides with an initial Ti-strip width of 4-7 μm are single-mode at 1.3-1.5 μm, support only transverse-magnetic mode, and have a loss of 1.4 dB/cm. The waveguides are NS, still retain LiNbO3 phase, and show stable 1531-nm small-signal enhancement under the 980-nm pump power of at least 216 mW, implying that the photorefractive effect is effectively suppressed. The waveguides would open up a way towards new devices. © 2006 IEEE.

AB - We report photorefractive-damage-resistant near-stoichiometric (NS) Ti:Mg:Er:LiNbO3 strip waveguides fabricated on an initially congruent, undoped Z-cut substrate in sequence by local Er-doping in air, MgTi prediffusion in wet O2 atmosphere, and post vapor-transport- equilibration. These waveguides with an initial Ti-strip width of 4-7 μm are single-mode at 1.3-1.5 μm, support only transverse-magnetic mode, and have a loss of 1.4 dB/cm. The waveguides are NS, still retain LiNbO3 phase, and show stable 1531-nm small-signal enhancement under the 980-nm pump power of at least 216 mW, implying that the photorefractive effect is effectively suppressed. The waveguides would open up a way towards new devices. © 2006 IEEE.

KW - Antiphotorefraction

KW - local Er-Mg-codoping

KW - near-stoichiometric (NS) Ti:Mg:Er:LiNbO3 waveguide

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