Abstract
High resolution, conformable phase masks provide a means to fabricate, in an experimentally simple manner, classes of three dimensional (3D) nanostructures that are technologically important but difficult to generate in other ways. This proposed approach can answer the greatest challenge of photonic system; a simple and reliable fabrication method of periodic and aperiodic structure. Those unique advantages of proximity field nanopatterning originated from direct conformal contact and a further application to multi-photon process, and a representative waveguiding structure are investigated. The patterning capability in a broad range of wavelengths (from UV to near-IR) and unusual structures place this method as a key technique for photonic system.
| Original language | English |
|---|---|
| Article number | 27 |
| Pages (from-to) | 187-195 |
| Journal | Progress in Biomedical Optics and Imaging - Proceedings of SPIE |
| Volume | 5720 |
| DOIs | |
| Publication status | Published - 2005 |
| Externally published | Yes |
| Event | Micromachining Technology for Micro-Optics and Nano-Optics III - San Jose, CA, United States Duration: 25 Jan 2005 → 27 Jan 2005 |
Bibliographical note
Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].Research Keywords
- Multi-photon process
- Phase mask
- Photonic crystal
- Proximity field nanopatterning (PnP)
Fingerprint
Dive into the research topics of 'Photonic systems formed by proximity field nanopatterning'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver