Photoluminescence and self-interference in germanium-doped silica films

Y. M. Yang, L. W. Yang, M. Q. Cai, Paul K. Chu

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    6 Citations (Scopus)

    Abstract

    Germanium-doped silica films were prepared by magnetron cosputtering and postannealing. The photoluminescence properties and their dependence on the Ge contents and annealing temperature were investigated. Our experiments indicate that the observed light emission originates from the neutral oxygen vacancy defects. The substructures in the luminescence bands of the films were found to result from multiple-beam interferences of the emission in the optical cavity formed by the transparent films. © 2007 American Institute of Physics.
    Original languageEnglish
    Article number93503
    JournalJournal of Applied Physics
    Volume101
    Issue number9
    DOIs
    Publication statusPublished - 2007

    Fingerprint

    Dive into the research topics of 'Photoluminescence and self-interference in germanium-doped silica films'. Together they form a unique fingerprint.

    Cite this