Phosphorus Diffusion in Partially Crystallized Films of SiO2

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

6 Scopus Citations
View graph of relations

Author(s)

  • D. R. Campbell
  • E. I. Alessandrini
  • K. N. Tu
  • J. E. Lewis

Detail(s)

Original languageEnglish
Pages (from-to)1081-1085
Journal / PublicationJournal of the Electrochemical Society
Volume121
Issue number8
Publication statusPublished - Aug 1974
Externally publishedYes

Abstract

The diffusion of phosphorus into thin SiC>2 films on Si was studied to assess the significance of an anomalous, rapid diffusion mode. Diffusions were performed over a wide range of temperature and time using neutron-activated, red phosphorus diffusion sources. It was found that diffusion anneals in P vapors catalyzed a localized amorphous-to-crystalline transformation in the initially amorphous films, creating rapid diffusion paths at the interfaces between the crystalline islands and the surrounding amorphous matrix. The shape of the penetration profiles confirmed that interfaces contributed to the flux of P through the film. Both rapid and normal diffusion coefficients were determined and are discussed. Crystallization with subsequent rapid diffusion may be a contributing factor to the failure of SiO2 diffusion masks. © 1974, The Electrochemical Society, Inc. All rights reserved.

Research Area(s)

  • diffusion mask. a-crystobalite, interface diffusion, network diffusion

Bibliographic Note

Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to lbscholars@cityu.edu.hk.

Citation Format(s)

Phosphorus Diffusion in Partially Crystallized Films of SiO2. / Campbell, D. R.; Alessandrini, E. I.; Tu, K. N. et al.

In: Journal of the Electrochemical Society, Vol. 121, No. 8, 08.1974, p. 1081-1085.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review