Passivation evolution of Ti -Ta-Nb medium-entropy sputtered thin films in sulfuric acid solution

W.Y. Chen; Y.H. Chen; W.P. Li; Rui Zhou; T.H. Chou; X. Wang; J.C. Huang

doi:10.1016/j.apsusc.2021.151824

Passivation evolution of Ti -Ta-Nb medium-entropy sputtered thin films in sulfuric acid solution

W.Y. Chen
, Y.H. Chen
, W.P. Li
, Rui Zhou
, T.H. Chou
, X. Wang
, J.C. Huang^*

^*Corresponding author for this work

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

38 Citations (Scopus)

Abstract

The microstructure and passivation behavior of the Ti-Ta-Nb medium-entropy alloy (MEA) films prepared by sputtering were investigated. The Ti-Ta-Nb MEA films show significantly improved corrosion resistance compared to pure Ti in 0.5 M H₂SO₄. The mechanisms of the passivation behavior and stability of the passive films were extensively explored and discussed. The passivation evolution phenomenon consisting of two passive regions is due to the variation of chemical compositions of passive films. The excellent corrosion resistance can be ascribed to the stable passive films consisting of the mixture of TiO₂/Ti₂O₃, Ta₂O₅ and Nb₂O₅, particularly Ta₂O₅.

Original language	English
Article number	151824
Journal	Applied Surface Science
Volume	576
Issue number	B
Online published	10 Nov 2021
DOIs	https://doi.org/10.1016/j.apsusc.2021.151824
Publication status	Published - 1 Feb 2022

Research Keywords

Titanium
Tantalum
Medium-entropy alloy
Sputtered film
Passive films

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10.1016/j.apsusc.2021.151824

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@article{2a64a338bb3c4e20a578d00ffc23152a,

title = "Passivation evolution of Ti -Ta-Nb medium-entropy sputtered thin films in sulfuric acid solution",

abstract = "The microstructure and passivation behavior of the Ti-Ta-Nb medium-entropy alloy (MEA) films prepared by sputtering were investigated. The Ti-Ta-Nb MEA films show significantly improved corrosion resistance compared to pure Ti in 0.5 M H2SO4. The mechanisms of the passivation behavior and stability of the passive films were extensively explored and discussed. The passivation evolution phenomenon consisting of two passive regions is due to the variation of chemical compositions of passive films. The excellent corrosion resistance can be ascribed to the stable passive films consisting of the mixture of TiO2/Ti2O3, Ta2O5 and Nb2O5, particularly Ta2O5.",

keywords = "Titanium, Tantalum, Medium-entropy alloy, Sputtered film, Passive films",

author = "W.Y. Chen and Y.H. Chen and W.P. Li and Rui Zhou and T.H. Chou and X. Wang and J.C. Huang",

year = "2022",

month = feb,

day = "1",

doi = "10.1016/j.apsusc.2021.151824",

language = "English",

volume = "576",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier B.V.",

number = "B",

}

TY - JOUR

T1 - Passivation evolution of Ti -Ta-Nb medium-entropy sputtered thin films in sulfuric acid solution

AU - Chen, W.Y.

AU - Chen, Y.H.

AU - Li, W.P.

AU - Zhou, Rui

AU - Chou, T.H.

AU - Wang, X.

AU - Huang, J.C.

PY - 2022/2/1

Y1 - 2022/2/1

N2 - The microstructure and passivation behavior of the Ti-Ta-Nb medium-entropy alloy (MEA) films prepared by sputtering were investigated. The Ti-Ta-Nb MEA films show significantly improved corrosion resistance compared to pure Ti in 0.5 M H2SO4. The mechanisms of the passivation behavior and stability of the passive films were extensively explored and discussed. The passivation evolution phenomenon consisting of two passive regions is due to the variation of chemical compositions of passive films. The excellent corrosion resistance can be ascribed to the stable passive films consisting of the mixture of TiO2/Ti2O3, Ta2O5 and Nb2O5, particularly Ta2O5.

AB - The microstructure and passivation behavior of the Ti-Ta-Nb medium-entropy alloy (MEA) films prepared by sputtering were investigated. The Ti-Ta-Nb MEA films show significantly improved corrosion resistance compared to pure Ti in 0.5 M H2SO4. The mechanisms of the passivation behavior and stability of the passive films were extensively explored and discussed. The passivation evolution phenomenon consisting of two passive regions is due to the variation of chemical compositions of passive films. The excellent corrosion resistance can be ascribed to the stable passive films consisting of the mixture of TiO2/Ti2O3, Ta2O5 and Nb2O5, particularly Ta2O5.

KW - Titanium

KW - Tantalum

KW - Medium-entropy alloy

KW - Sputtered film

KW - Passive films

UR - https://www.scopus.com/pages/publications/85119100331

UR - https://www.scopus.com/pages/publications/85119100331#tab=impact

U2 - 10.1016/j.apsusc.2021.151824

DO - 10.1016/j.apsusc.2021.151824

M3 - RGC 21 - Publication in refereed journal

SN - 0169-4332

VL - 576

JO - Applied Surface Science

JF - Applied Surface Science

IS - B

M1 - 151824

ER -

Passivation evolution of Ti -Ta-Nb medium-entropy sputtered thin films in sulfuric acid solution

Abstract

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Passivation evolution of Ti -Ta-Nb medium-entropy sputtered thin films in sulfuric acid solution

Abstract

Research Keywords

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ResInst: Hong Kong Institute for Advanced Study

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