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p-Type InN and In-rich InGaN

J. W. Ager III*, R. E. Jones, D. M. Yamaguchi, K. M. Yu, W. Walukiewicz, S. X. Li, E. E. Haller, H. Lu, W. J. Schaff

*Corresponding author for this work

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

Abstract

Capacitance-voltage (CV) measurements using a liquid electrolyte as rectifying contact were used to provide definitive proof of p-type activity beneath a surface inversion layer in Mg-doped InN and In-rich InGaN. Analysis of CV data using the Poisson equation allows net charge as a function of depth to be determined. In undoped InN, good agreement of the net donor concentration below the surface accumulation layer with bulk Hall effect data is obtained. In Mg-doped InN and InGaN, the CV data are shown to be consistent with the presence of a net acceptor concentration NA-ND near 1019 cm-3 below a surface inversion laver. © 2007 WILEY-VCH Verlag GmbH & Co. KGaA.
Original languageEnglish
Pages (from-to)1820-1824
JournalPhysica Status Solidi (B) Basic Research
Volume244
Issue number6
DOIs
Publication statusPublished - Jun 2007
Externally publishedYes

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