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P-type InGaN across entire composition range

  • K. Wang*
  • , T. Katsuki
  • , J. Sakaguchi
  • , T. Araki
  • , Y. Nanishi
  • , K. M. Yu
  • , M. A. Mayer
  • , E. Alarcon-Llado
  • , J. W. Ager III
  • , W. Walukiewicz
  • *Corresponding author for this work

Research output: Chapters, Conference Papers, Creative and Literary WorksRGC 32 - Refereed conference paper (with host publication)peer-review

Abstract

We report a systematic investigation on Mg doped InGaN epilayers grown by plasma-assisted molecular beam epitaxy. Hall effect, thermopower and electrochemical capacitance voltage experiments have been combined to investigate the conduction properties. The results show the realization of p-type InGaN across the entire alloy composition range. © 2012 IEEE.
Original languageEnglish
Title of host publicationICSICT 2012 - 2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology, Proceedings
DOIs
Publication statusPublished - 2012
Externally publishedYes
Event2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2012 - Xi'an, China
Duration: 29 Oct 20121 Nov 2012

Conference

Conference2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2012
PlaceChina
CityXi'an
Period29/10/121/11/12

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