Oxidation suppression in ytterbium silicidation by TiTiN bicapping layer

Yu-Long Jiang; Qi Xie; Christophe Detavernier; R. L. Van Meirhaeghe; Guo-Ping Ru; Xin-Ping Qu; Bing-Zong Li; Anping Huang; Paul K. Chu

doi:10.1116/1.2464123

Author(s)

Yu-Long Jiang
Qi Xie
Christophe Detavernier
R. L. Van Meirhaeghe
Guo-Ping Ru
Xin-Ping Qu
Bing-Zong Li
Anping Huang

Detail(s)

Original language	English
Pages (from-to)	285-289
Journal / Publication	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	25
Issue number	2
Publication status	Published - 2007

Link(s)

DOI	DOI https://doi.org/10.1116/1.2464123 Final Published version
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Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-34248592929&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(ca5c1490-6ca3-4257-98df-9a827ca3b28a).html

Abstract

Ytterbium (Yb) silicide is a promising contact material due to its low contact resistance and small Schottky barrier height in contact with n -type Si. However, as one of the rare earth metals, Yb is easily oxidized during physical vapor deposition and rapid thermal annealing. In this article, a bilayered TiTiN cap is proposed and demonstrated to effectively suppress oxidation during Yb silicidation. The authors' results reveal that diffusion of Ti atoms in the TiN layer plays a key role in oxidation suppression. © 2007 American Vacuum Society.

Citation Format(s)

[ RIS ] [ BibTeX ]

Oxidation suppression in ytterbium silicidation by TiTiN bicapping layer. / Jiang, Yu-Long; Xie, Qi; Detavernier, Christophe et al.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 25, No. 2, 2007, p. 285-289.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

Jiang, Y-L, Xie, Q, Detavernier, C, Van Meirhaeghe, RL, Ru, G-P, Qu, X-P, Li, B-Z, Huang, A & Chu, PK 2007, 'Oxidation suppression in ytterbium silicidation by TiTiN bicapping layer', Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, vol. 25, no. 2, pp. 285-289. https://doi.org/10.1116/1.2464123

Jiang, Y-L., Xie, Q., Detavernier, C., Van Meirhaeghe, R. L., Ru, G-P., Qu, X-P., Li, B-Z., Huang, A., & Chu, P. K. (2007). Oxidation suppression in ytterbium silicidation by TiTiN bicapping layer. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 25(2), 285-289. https://doi.org/10.1116/1.2464123

Jiang Y-L, Xie Q, Detavernier C, Van Meirhaeghe RL, Ru G-P, Qu X-P et al. Oxidation suppression in ytterbium silicidation by TiTiN bicapping layer. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2007;25(2):285-289. doi: 10.1116/1.2464123

Jiang, Yu-Long ; Xie, Qi ; Detavernier, Christophe et al. / Oxidation suppression in ytterbium silicidation by TiTiN bicapping layer. In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2007 ; Vol. 25, No. 2. pp. 285-289.