Oxidation suppression in ytterbium silicidation by TiTiN bicapping layer

Yu-Long Jiang; Qi Xie; Christophe Detavernier; R. L. Van Meirhaeghe; Guo-Ping Ru; Xin-Ping Qu; Bing-Zong Li; Anping Huang; Paul K. Chu

doi:10.1116/1.2464123

Oxidation suppression in ytterbium silicidation by TiTiN bicapping layer

Yu-Long Jiang, Qi Xie, Christophe Detavernier, R. L. Van Meirhaeghe, Guo-Ping Ru, Xin-Ping Qu, Bing-Zong Li, Anping Huang, Paul K. Chu

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

13 Citations (Scopus)

Abstract

Ytterbium (Yb) silicide is a promising contact material due to its low contact resistance and small Schottky barrier height in contact with n -type Si. However, as one of the rare earth metals, Yb is easily oxidized during physical vapor deposition and rapid thermal annealing. In this article, a bilayered TiTiN cap is proposed and demonstrated to effectively suppress oxidation during Yb silicidation. The authors' results reveal that diffusion of Ti atoms in the TiN layer plays a key role in oxidation suppression. © 2007 American Vacuum Society.

Original language	English
Pages (from-to)	285-289
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	25
Issue number	2
DOIs	https://doi.org/10.1116/1.2464123
Publication status	Published - 2007

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title = "Oxidation suppression in ytterbium silicidation by TiTiN bicapping layer",

abstract = "Ytterbium (Yb) silicide is a promising contact material due to its low contact resistance and small Schottky barrier height in contact with n -type Si. However, as one of the rare earth metals, Yb is easily oxidized during physical vapor deposition and rapid thermal annealing. In this article, a bilayered TiTiN cap is proposed and demonstrated to effectively suppress oxidation during Yb silicidation. The authors' results reveal that diffusion of Ti atoms in the TiN layer plays a key role in oxidation suppression. {\textcopyright} 2007 American Vacuum Society.",

author = "Yu-Long Jiang and Qi Xie and Christophe Detavernier and {Van Meirhaeghe}, {R. L.} and Guo-Ping Ru and Xin-Ping Qu and Bing-Zong Li and Anping Huang and Chu, {Paul K.}",

year = "2007",

doi = "10.1116/1.2464123",

language = "English",

volume = "25",

pages = "285--289",

journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

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TY - JOUR

T1 - Oxidation suppression in ytterbium silicidation by TiTiN bicapping layer

AU - Jiang, Yu-Long

AU - Xie, Qi

AU - Detavernier, Christophe

AU - Van Meirhaeghe, R. L.

AU - Ru, Guo-Ping

AU - Qu, Xin-Ping

AU - Li, Bing-Zong

AU - Huang, Anping

AU - Chu, Paul K.

PY - 2007

Y1 - 2007

N2 - Ytterbium (Yb) silicide is a promising contact material due to its low contact resistance and small Schottky barrier height in contact with n -type Si. However, as one of the rare earth metals, Yb is easily oxidized during physical vapor deposition and rapid thermal annealing. In this article, a bilayered TiTiN cap is proposed and demonstrated to effectively suppress oxidation during Yb silicidation. The authors' results reveal that diffusion of Ti atoms in the TiN layer plays a key role in oxidation suppression. © 2007 American Vacuum Society.

AB - Ytterbium (Yb) silicide is a promising contact material due to its low contact resistance and small Schottky barrier height in contact with n -type Si. However, as one of the rare earth metals, Yb is easily oxidized during physical vapor deposition and rapid thermal annealing. In this article, a bilayered TiTiN cap is proposed and demonstrated to effectively suppress oxidation during Yb silicidation. The authors' results reveal that diffusion of Ti atoms in the TiN layer plays a key role in oxidation suppression. © 2007 American Vacuum Society.

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UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-34248592929&origin=recordpage

U2 - 10.1116/1.2464123

DO - 10.1116/1.2464123

M3 - RGC 21 - Publication in refereed journal

SN - 0734-2101

VL - 25

SP - 285

EP - 289

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 2

ER -

Oxidation suppression in ytterbium silicidation by TiTiN bicapping layer

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