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Oxidation resistance of quintuple Ti-Al-Si-C-N coatings and associated mechanism

  • Guizhi Wu
  • , Shengli Ma
  • , Kewei Xu
  • , Vincent Ji
  • , Paul K. Chu

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Abstract

    The oxidation behavior of Ti-Al-Si-C-N hard coatings with different Al contents deposited on high-speed steel and Si substrates by hybrid arc-enhanced magnetron sputtering is investigated in the temperature range of 500 °C-1000 °C. The coating hardness is maintained at around 35 GPa, and the parabolic oxidation rate constant K p at 1000 °C decreases to 3.36 10 -10 kg 2 m -4 s -1 when the Al concentration is increased to 30 at. % , indicating that Ti-Al-Si-C-N coatings with larger Al concentrations have better oxidation resistance. X-ray diffraction, cross-sectional scanning electron microscopy, and x-ray photoelectron spectroscopy reveal a protective surface layer consisting of Al 2O 3, TiO 2, and SiO 2 that retards inward oxygen diffusion. A mechanism is proposed to elucidate the oxide formation. As a consequence of the good oxidation resistance, the Ti-Al-Si-C-N coatings have a large potential in high-speed dry cutting as well as other high temperature applications. © 2012 American Vacuum Society.
    Original languageEnglish
    Article number41508
    JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
    Volume30
    Issue number4
    DOIs
    Publication statusPublished - Jul 2012

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