Origin of Initial Current Peak in High Power Impulse Magnetron Sputtering and Verification by Non-Sputtering Discharge

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • Zhong-Zhen Wu
  • Shu Xiao
  • Sui-Han Cui
  • Ricky K. Y. Fu
  • Xiu-Bo Tian
  • Feng Pan

Detail(s)

Original languageEnglish
Article number75201
Journal / PublicationChinese Physics Letters
Volume33
Issue number7
Publication statusPublished - 1 Jul 2016

Abstract

A non-sputtering discharge is utilized to verify the effect of replacement of gas ions by metallic ions and consequent decrease in the secondary electron emission coefficient in the discharge current curves in high-power impulse magnetron sputtering (HiPIMS). In the non-sputtering discharge involving hydrogen, replacement of ions is avoided while the rarefaction still contributes. The initial peak and ensuing decay disappear and all the discharge current curves show a similar feature as the HiPIMS discharge of materials with low sputtering yields such as carbon. The results demonstrate the key effect of ion replacement during sputtering.

Citation Format(s)

Origin of Initial Current Peak in High Power Impulse Magnetron Sputtering and Verification by Non-Sputtering Discharge. / Wu, Zhong-Zhen; Xiao, Shu; Cui, Sui-Han; Fu, Ricky K. Y.; Tian, Xiu-Bo; Chu, Paul K.; Pan, Feng.

In: Chinese Physics Letters, Vol. 33, No. 7, 75201, 01.07.2016.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review