TY - JOUR
T1 - Origin of Initial Current Peak in High Power Impulse Magnetron Sputtering and Verification by Non-Sputtering Discharge
AU - Wu, Zhong-Zhen
AU - Xiao, Shu
AU - Cui, Sui-Han
AU - Fu, Ricky K. Y.
AU - Tian, Xiu-Bo
AU - Chu, Paul K.
AU - Pan, Feng
PY - 2016/7/1
Y1 - 2016/7/1
N2 - A non-sputtering discharge is utilized to verify the effect of replacement of gas ions by metallic ions and consequent decrease in the secondary electron emission coefficient in the discharge current curves in high-power impulse magnetron sputtering (HiPIMS). In the non-sputtering discharge involving hydrogen, replacement of ions is avoided while the rarefaction still contributes. The initial peak and ensuing decay disappear and all the discharge current curves show a similar feature as the HiPIMS discharge of materials with low sputtering yields such as carbon. The results demonstrate the key effect of ion replacement during sputtering.
AB - A non-sputtering discharge is utilized to verify the effect of replacement of gas ions by metallic ions and consequent decrease in the secondary electron emission coefficient in the discharge current curves in high-power impulse magnetron sputtering (HiPIMS). In the non-sputtering discharge involving hydrogen, replacement of ions is avoided while the rarefaction still contributes. The initial peak and ensuing decay disappear and all the discharge current curves show a similar feature as the HiPIMS discharge of materials with low sputtering yields such as carbon. The results demonstrate the key effect of ion replacement during sputtering.
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U2 - 10.1088/0256-307X/33/7/075201
DO - 10.1088/0256-307X/33/7/075201
M3 - RGC 21 - Publication in refereed journal
SN - 0256-307X
VL - 33
JO - Chinese Physics Letters
JF - Chinese Physics Letters
IS - 7
M1 - 75201
ER -