Optical-damage-resistant highly Er3+-doped Ti:Er : LiNbO 3 strip waveguide

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • De-Long Zhang
  • Fang Han
  • Bei Chen
  • Ping-Rang Hua
  • Dao-Yin Yu

Related Research Unit(s)

Detail(s)

Original languageEnglish
Article number6668871
Pages (from-to)135-140
Journal / PublicationJournal of Lightwave Technology
Volume32
Issue number1
Publication statusPublished - 1 Jan 2014

Abstract

We report optical-damage-resistant Ti:Er:LiNbO3 strip waveguide with high diffusion-doped surface Er3+ concentration. The waveguide was fabricated starting from a commercial X-cut congruent LiNbO3 plate with a two-step technological process in sequence of simultaneous work of Er3+ diffusion doping and Li-poor vapor transport equilibration treatment, and fabrication of 6-μm-wide Ti-diffused strip waveguide (Z-propagation). The waveguide retains still the LiNbO3 phase and has the waveguiding characteristics similar to the conventional Ti:LiNbO 3 waveguide except with a larger loss due to the imperfection of waveguide. Secondary ion mass spectrometry study shows that the Er3+ diffusion reservoir was exhausted and the profile is the desired Gaussian-type with a surface concentration 1.0 mol%, which is about two times larger than the value of conventional Ti:Er:LiNbO3 amplifier. Further optical characterization shows that the waveguide shows stable 1547 nm small-signal gain under the 980 nm pumping without serious photorefractive effect observed. An unsaturated gain 1.7 dB/cm is obtained for the available coupled pump power of 160 mW.With increased pump power, optimized Er3+ diffusion condition and degraded loss figure, a higher gain is expected. © 2013 IEEE.

Research Area(s)

  • Er3+ diffusion-doping, High Er3+ concentration, Photorefractive effect, Ti:Er:LiNbO3 strip waveguide.

Citation Format(s)

Optical-damage-resistant highly Er3+-doped Ti:Er: LiNbO 3 strip waveguide. / Zhang, De-Long; Han, Fang; Chen, Bei et al.
In: Journal of Lightwave Technology, Vol. 32, No. 1, 6668871, 01.01.2014, p. 135-140.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review