Abstract
Controllable nanoscale patterning of a photoresist is achieved via flood UV illumination with the assistance of conformably attached surface-textured polymer films. These polymer films can be reused numerous times, enabling the cost-effective and reliable fabrication of highly ordered nanopatterned arrays for widespread applications, from plasmonic sensors and multifunctional coatings to photovoltaics.
| Original language | English |
|---|---|
| Pages (from-to) | 855-860 |
| Journal | Advanced Optical Materials |
| Volume | 2 |
| Issue number | 9 |
| Online published | 26 May 2014 |
| DOIs | |
| Publication status | Published - Sept 2014 |
Research Keywords
- Nanoscale patterning
- Photolithography
- Photoresists
- Polymer films
- Soft masks
- Surface plasmons
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Dive into the research topics of 'Optical Nanoscale Patterning Through Surface-Textured Polymer Films'. Together they form a unique fingerprint.Projects
- 1 Finished
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ECS: High-Performance Wrap-Gated III-V Nanowire Parallel Array MOSFETs on Silicon
HO, J. C. Y. (Principal Investigator / Project Coordinator)
1/01/14 → 22/12/17
Project: Research
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