Optical mask for use in a photolithography process, a method for fabricating the optical mask and a method for fabricating an array of patterns on a substrate using the optical mask

Research output: Patents, Agreements and Assignments (RGC: 51, 52, 53)51_Patents granted (CityU only, data source from KTO)

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Detail(s)

Original languageEnglish
Patent numberUS10,663,856
Filing number15/685,140
Publication status
  • Accepted/In press/Filed - 24 Aug 2017
  • Published - 26 May 2020

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