Optical mask for use in a photolithography process, a method for fabricating the optical mask and a method for fabricating an array of patterns on a substrate using the optical mask

Research output: Patents, Agreements and Assignments (RGC: 51, 52, 53) › 51_Patents granted (CityU only, data source from KTO)

Overview

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Author(s)

Johnny Chung Yin HO (Inventor)
Ming FANG (Inventor)
Lei SHU (Inventor)

Related Research Unit(s)

Department of Materials Science and Engineering

Detail(s)

Original language	English
Patent number	US10,663,856
Filing number	15/685,140
Publication status	Accepted/In press/Filed - 24 Aug 2017 Published - 26 May 2020

Link(s)

	Check@CityULib
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(e98db2c4-a9af-44e9-b9b1-fba577ff8929).html

Citation Format(s)

[ RIS ] [ BibTeX ]

Optical mask for use in a photolithography process, a method for fabricating the optical mask and a method for fabricating an array of patterns on a substrate using the optical mask. / HO, Johnny Chung Yin (Inventor); FANG, Ming (Inventor); SHU, Lei (Inventor).

Patent No.: US10,663,856. May 26, 2020.

Research output: Patents, Agreements and Assignments (RGC: 51, 52, 53) › 51_Patents granted (CityU only, data source from KTO)

HO, JCY, FANG, M & SHU, L May. 26 2020, Optical mask for use in a photolithography process, a method for fabricating the optical mask and a method for fabricating an array of patterns on a substrate using the optical mask, Patent No. US10,663,856.

HO, J. C. Y., FANG, M., & SHU, L. (2020). Optical mask for use in a photolithography process, a method for fabricating the optical mask and a method for fabricating an array of patterns on a substrate using the optical mask. (Patent No. US10,663,856).

HO JCY, FANG M, SHU L, inventors. Optical mask for use in a photolithography process, a method for fabricating the optical mask and a method for fabricating an array of patterns on a substrate using the optical mask. US10,663,856. 2020 May 26.

HO, Johnny Chung Yin (Inventor) ; FANG, Ming (Inventor) ; SHU, Lei (Inventor). / Optical mask for use in a photolithography process, a method for fabricating the optical mask and a method for fabricating an array of patterns on a substrate using the optical mask. Patent No.: US10,663,856. May 26, 2020.