Optical mask for use in a photolithography process, a method for fabricating the optical mask and a method for fabricating an array of patterns on a substrate using the optical mask

Johnny Chung Yin HO; Ming FANG; Lei SHU

Optical mask for use in a photolithography process, a method for fabricating the optical mask and a method for fabricating an array of patterns on a substrate using the optical mask

Johnny Chung Yin HO (Inventor)
, Ming FANG (Inventor)
, Lei SHU (Inventor)

Department of Materials Science and Engineering

Research output: Patents, Agreements and Assignments › RGC 51 - Patents (CityUHK)

Original language	English
Patent number	US10,663,856
Publication status	Published - 26 May 2020

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title = "Optical mask for use in a photolithography process, a method for fabricating the optical mask and a method for fabricating an array of patterns on a substrate using the optical mask",

author = "HO, \{Johnny Chung Yin\} and Ming FANG and Lei SHU",

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day = "26",

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Optical mask for use in a photolithography process, a method for fabricating the optical mask and a method for fabricating an array of patterns on a substrate using the optical mask. / HO, Johnny Chung Yin (Inventor); FANG, Ming (Inventor); SHU, Lei (Inventor).
Patent No.: US10,663,856. May 26, 2020.

Research output: Patents, Agreements and Assignments › RGC 51 - Patents (CityUHK)

TY - PAT

T1 - Optical mask for use in a photolithography process, a method for fabricating the optical mask and a method for fabricating an array of patterns on a substrate using the optical mask

AU - HO, Johnny Chung Yin

AU - FANG, Ming

AU - SHU, Lei

PY - 2020/5/26

Y1 - 2020/5/26

UR - https://www.cityu.edu.hk/kto/technology-redirect/559

M3 - RGC 51 - Patents (CityUHK)

M1 - US10,663,856

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Optical mask for use in a photolithography process, a method for fabricating the optical mask and a method for fabricating an array of patterns on a substrate using the optical mask

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