Optical-damage-resistant MgO-diffused near-stoichiometric Ti: LiNbO 3 strip waveguides

Ping-Rang Hua, Shuai Zhang, Na Dong, Dao-Yin Yu, Edwin Yue-Bun Pun, De-Long Zhang

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

5 Citations (Scopus)

Abstract

We report near-stoichiometric (NS) Ti:Mg:LiNbO 3 strip waveguides fabricated starting from a Z-cut pure congruent LiNbO3 substrate in sequence by Ti- and MgO-diffusion and post vapor transport equilibration. These waveguides with an initial Ti-strip width of 4-8 μm well support transverse magnetic mode, are single-mode at 0.98- and 1.5-μm wavelengths, have a smooth surface and a loss as low as 0.1 dB/cm at 1.5 μm. The waveguides are NS and optical-damage-resistant, and have a homogeneous Mg concentration of 1.7 ± 0.3 mol% in the guiding layer. Such a waveguide is promising for nonlinear integrated optics. © 2011 IEEE.
Original languageEnglish
Article number6151037
Pages (from-to)491-493
JournalIEEE Photonics Technology Letters
Volume24
Issue number6
DOIs
Publication statusPublished - 2012

Research Keywords

  • MgO-diffusion
  • Near-stoichiometric (NS) Ti:Mg:LiNbO 3 waveguide
  • Photorefractive effect

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