Numerical Modeling of Plasma Immersion Ion Implantation on Fabrication of Silicon-On-Insulator and Plasma Doping

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

Original language	English
Title of host publication	Abstract for the 14th International Conference on Ion Implantation Technology, IIT 2002
Publication status	Published - Sept 2002
Event	14th International Conference on Ion Implantation Technology - Taos, United States Duration: 22 Sept 2002 → 27 Sept 2002

Conference	14th International Conference on Ion Implantation Technology
Abbreviated title	IIT 2002
Place	United States
City	Taos
Period	22/09/02 → 27/09/02

Other Access Options

@inproceedings{936b7de5f9444cf79fbaf6b4558a1a60,

title = "Numerical Modeling of Plasma Immersion Ion Implantation on Fabrication of Silicon-On-Insulator and Plasma Doping",

author = "Kwok, \{DIxon T. K.\} and Chu, \{Paul K.\}",

year = "2002",

month = sep,

language = "English",

booktitle = "Abstract for the 14th International Conference on Ion Implantation Technology, IIT 2002",

note = "14th International Conference on Ion Implantation Technology, IIT 2002 ; Conference date: 22-09-2002 Through 27-09-2002",

}

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

TY - GEN

T1 - Numerical Modeling of Plasma Immersion Ion Implantation on Fabrication of Silicon-On-Insulator and Plasma Doping

AU - Kwok, DIxon T. K.

AU - Chu, Paul K.

PY - 2002/9

Y1 - 2002/9

M3 - RGC 32 - Refereed conference paper (with host publication)

BT - Abstract for the 14th International Conference on Ion Implantation Technology, IIT 2002

T2 - 14th International Conference on Ion Implantation Technology

Y2 - 22 September 2002 through 27 September 2002

ER -