Novel plasma immersion ion implantation and deposition hardware and technique based on high power pulsed magnetron discharge

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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  • Zhongzhen Wu
  • Xiubo Tian
  • Jingwei Shi
  • Zeming Wang
  • Chunzhi Gong
  • Shiqin Yang


Original languageEnglish
Article number33511
Journal / PublicationReview of Scientific Instruments
Issue number3
Publication statusPublished - Mar 2011


A novel plasma immersion ion implantation technique based on high power pulsed magnetron sputtering (HPPMS) discharge that can produce a high density metal plasma is described. The metal plasma is clean and does not suffer from contamination from macroparticles, and the process can be readily scaled up for industrial production. The hardware, working principle, and operation modes are described. A matching circuit is developed to modulate the high-voltage and HPPMS pulses to enable operation under different modes such as simultaneous implantation and deposition, pure implantation, and selective implantation. To demonstrate the efficacy of the system and technique, CrN films with a smooth and dense surface without macroparticles were produced. An excellent adhesion with a critical load of 59.9 N is achieved for the pure implantation mode. © 2011 American Institute of Physics.

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