Non-thermal plasma induces apoptosis accompanied by protective autophagy via activating JNK/Sestrin2 pathway

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • Jie Ma
  • Hao Zhang
  • Lili Nie
  • Cheng Cheng
  • Shujun Cui
  • Miaomiao Yang
  • Guodong Chen
  • Wei Han

Detail(s)

Original languageEnglish
Article number465201
Journal / PublicationJournal of Physics D: Applied Physics
Volume53
Issue number46
Online published20 Aug 2020
Publication statusPublished - Nov 2020

Abstract

Although non-thermal plasma (NTP) has been proved to be an effective way to kill cancer cells, the mechanism of NTP-induced cancer cell death is still not clear. In this study, we found that NTP exposure caused reactive oxygen species generation and apoptosis in A549 and MDA-MB-231 cells. Meanwhile, NTP treatment also induced autophagy, as evidenced by the formation of acidic vesicular organelles and conversion of LC3-I to LC3-II. Suppression of autophagy by chloroquine significantly increased NTP-induced cell death, indicating that NTP-induced autophagy acted in a protective role from apoptosis. Furthermore, NTP treatment significantly increased Sestrin2 (Sesn2) expression and activated the JNK signaling pathway. Knocking down Sesn2 with special siRNA enhanced NTP-induced cell death, while pretreatment with JNK inhibitor abolished the increase of Sesn2 and LC3 formation, and promoted cell apoptosis induced by NTP. These indicated that the JNK/Sesn2 pathway was involved in autophagy and apoptosis induced by NTP. These findings provided evidence that supplement with autophagy inhibition might be a useful strategy to improve the tumor cell killing effect of NTP.

Research Area(s)

  • apoptosis, c-JUN N-terminal kinase, non-thermal plasma, protective autophagy, Sestrin2

Citation Format(s)

Non-thermal plasma induces apoptosis accompanied by protective autophagy via activating JNK/Sestrin2 pathway. / Ma, Jie; Yu, K N; Zhang, Hao; Nie, Lili; Cheng, Cheng; Cui, Shujun; Yang, Miaomiao; Chen, Guodong; Han, Wei.

In: Journal of Physics D: Applied Physics, Vol. 53, No. 46, 465201, 11.2020.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review