Nitrogenated amorphous carbon films synthesized by electron cyclotron plasma enhanced chemical vapor deposition

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • W. C. Chan
  • M. K. Fung
  • I. Bello
  • C. S. Lee
  • S. T. Lee

Detail(s)

Original languageEnglish
Pages (from-to)1732-1736
Journal / PublicationDiamond and Related Materials
Volume8
Issue number8-9
Publication statusPublished - Aug 1999

Abstract

Nitrogenated amorphous carbon (a-CNx:H) films were investigated as protective overcoats for industrial applications. Thin a-CNx:H films have been deposited on silicon by electron cyclotron resonance plasma-enhanced chemical vapor deposition. The substrate bias was found to play an important role in determining the chemical compositions and mechanical properties of the films. The surface roughness and hardness of the films can reach 1.4 Å and 20 GPa, respectively. The influence of mechanical properties by hydrogen was studied. A correlation exists between the background slope of Raman spectra and the hydrogen content as determined by elastic recoil detection analysis. © 1999 Elsevier Science S.A. All rights reserved.

Research Area(s)

  • Nitrogenated amorphous carbon, Plasma-enhanced chemical vapor deposition

Citation Format(s)

Nitrogenated amorphous carbon films synthesized by electron cyclotron plasma enhanced chemical vapor deposition. / Chan, W. C.; Fung, M. K.; Bello, I. et al.
In: Diamond and Related Materials, Vol. 8, No. 8-9, 08.1999, p. 1732-1736.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review