Nitrogen Incorporation in Hafnium Oxide Using Plasma Immersion Implantation

Banani Sen; Hei Wong; B. L. Yang; A.P. Huang; P. K. Chu; V. Filipt; C. K. Sarkar

Nitrogen Incorporation in Hafnium Oxide Using Plasma Immersion Implantation

Banani Sen
, Hei Wong^*
, B. L. Yang
, A.P. Huang
, P. K. Chu
, V. Filipt
, C. K. Sarkar

^*Corresponding author for this work

Research output: Conference Papers › RGC 32 - Refereed conference paper (without host publication) › peer-review

Original language	English
Pages	89-90
Publication status	Published - Nov 2006
Event	2006 International Workshop on Dielectric Thin Films for Future ULSI Devices: Science and Technology (IWDTF2006) - Kawasaki City Industrial Promotion Hall, Kanagawa, Japan Duration: 8 Nov 2006 → 10 Nov 2006 https://ieeexplore.ieee.org/document/1637581

Conference

Conference	2006 International Workshop on Dielectric Thin Films for Future ULSI Devices: Science and Technology (IWDTF2006)
Abbreviated title	IWDTF2006
Place	Japan
City	Kanagawa
Period	8/11/06 → 10/11/06
Internet address	https://ieeexplore.ieee.org/document/1637581

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Research Unit(s) information for this publication is provided by the author(s) concerned.

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@conference{3bc91c5c6e4f45649e83abb4e78c727f,

title = "Nitrogen Incorporation in Hafnium Oxide Using Plasma Immersion Implantation",

author = "Banani Sen and Hei Wong and Yang, \{B. L.\} and A.P. Huang and Chu, \{P. K.\} and V. Filipt and Sarkar, \{C. K.\}",

note = "Research Unit(s) information for this publication is provided by the author(s) concerned.; 2006 International Workshop on Dielectric Thin Films for Future ULSI Devices: Science and Technology (IWDTF2006), IWDTF2006 ; Conference date: 08-11-2006 Through 10-11-2006",

year = "2006",

month = nov,

language = "English",

pages = "89--90",

url = "https://ieeexplore.ieee.org/document/1637581",

}

Nitrogen Incorporation in Hafnium Oxide Using Plasma Immersion Implantation. / Sen, Banani; Wong, Hei; Yang, B. L. et al.
2006. 89-90 Paper presented at 2006 International Workshop on Dielectric Thin Films for Future ULSI Devices: Science and Technology (IWDTF2006), Kanagawa, Japan.

Research output: Conference Papers › RGC 32 - Refereed conference paper (without host publication) › peer-review

TY - CONF

T1 - Nitrogen Incorporation in Hafnium Oxide Using Plasma Immersion Implantation

AU - Sen, Banani

AU - Wong, Hei

AU - Yang, B. L.

AU - Huang, A.P.

AU - Chu, P. K.

AU - Filipt, V.

AU - Sarkar, C. K.

N1 - Research Unit(s) information for this publication is provided by the author(s) concerned.

PY - 2006/11

Y1 - 2006/11

M3 - RGC 32 - Refereed conference paper (without host publication)

SP - 89

EP - 90

T2 - 2006 International Workshop on Dielectric Thin Films for Future ULSI Devices: Science and Technology (IWDTF2006)

Y2 - 8 November 2006 through 10 November 2006

ER -