Nanostructured thin films as functional coatings

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalNot applicablepeer-review

6 Scopus Citations
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Author(s)

Detail(s)

Original languageEnglish
Article number12017
Journal / PublicationIOP Conference Series: Materials Science and Engineering
Volume12
Issue number1
Publication statusPublished - 2010
Externally publishedYes

Conference

Title4th International Conference on Innovation in Thin Film Processing and Characterization, ITFPC 2009
PlaceFrance
CityNancy
Period17 - 20 November 2009

Abstract

Nanostructured thin films is one of the highly exploiting research areas particularly in applications such as photovoltaics, photocatalysis and sensor technologies. Highly tuned thin films, in terms of thickness, crystallinity, porosity and optical properties, can be fabricated on different substrates using the sol-gel method, chemical solution deposition (CSD), electrochemical etching, along with other conventional methods such as chemical vapour deposition (CVD) and physical vapour deposition (PVD). The above mentioned properties of these films are usually characterised using surface analysis techniques such as XRD, SEM, TEM, AFM, ellipsometry, electrochemistry, SAXS, reflectance spectroscopy, STM, XPS, SIMS, ESCA, X-ray topography and DOSY-NMR. This article presents a short review of the preparation and characterisation of thin films of nanocrystalline titanium dioxide and modified silicon as well as their application in solar cells, water treatment, water splitting, self cleaning fabrics, sensors, optoelectronic devices and lab on chip systems.

Citation Format(s)

Nanostructured thin films as functional coatings. / Lazar, Manoj A.; Tadvani, Jalil K.; Tung, Wing Sze; Lopez, Lorena; Daoud, Walid A.

In: IOP Conference Series: Materials Science and Engineering, Vol. 12, No. 1, 12017, 2010.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalNot applicablepeer-review