Nano-scale surface morphology, wettability and osteoblast adhesion on nitrogen plasma-implanted NiTi shape memory alloy

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • X. M. Liu
  • S. L Wu
  • C. L. Chu
  • Y. L. Chan
  • K. O. Lam
  • K. W K Yeung
  • W. W. Lu
  • K. M C Cheung
  • K. D K Luk

Detail(s)

Original languageEnglish
Pages (from-to)3449-3454
Journal / PublicationJournal of Nanoscience and Nanotechnology
Volume9
Issue number6
Publication statusPublished - Jun 2009

Abstract

Plasma immersion ion implantation (PIN) is an effective method to increase the corrosion resistance and inhibit nickel release from orthopedic NiTi shape memory alloy. Nitrogen was plasma-implanted into NiTi using different pulsing frequencies to investigate the effects on the nano-scale surface morphology, structure, wettability, as well as biocompatibility. X-ray photoelectron spectroscopy (XPS) results show that the implantation depth of nitrogen increases with higher pulsing frequencies. Atomic force microscopy (AFM) discloses that the nano-scale surface roughness increases and surface features are changed from islands to spiky cones with higher pulsing frequencies. This variation in the nano surface structures leads to different surface free energy (SFE) monitored by contact angle measurements. The adhesion, spreading, and proliferation of osteoblasts on the implanted NiTi surface are assessed by cell culture tests. Our results indicate that the nano-scale surface morphology that is altered by the implantation frequencies impacts the surface free energy and wettability of the NiTi surfaces, and in turn affects the osteoblast adhesion behavior. Copyright © 2009 American Scientific Publishers All rights reserved.

Research Area(s)

  • NiTi, Plasma immersion ion implantation, Pulsing frequency, Surface free energy, Surface morphology and roughness

Citation Format(s)

Nano-scale surface morphology, wettability and osteoblast adhesion on nitrogen plasma-implanted NiTi shape memory alloy. / Liu, X. M.; L Wu, S.; Chu, Paul K.; Chung, C. Y.; Chu, C. L.; Chan, Y. L.; Lam, K. O.; Yeung, K. W K; Lu, W. W.; Cheung, K. M C; Luk, K. D K.

In: Journal of Nanoscience and Nanotechnology, Vol. 9, No. 6, 06.2009, p. 3449-3454.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review