Nanopatterning with conformable phase masks

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

Detail(s)

Original languageEnglish
Pages (from-to)149-154
Journal / PublicationJournal of Photochemistry and Photobiology A: Chemistry
Volume166
Issue number1-3
Publication statusPublished - 12 Aug 2004
Externally publishedYes

Abstract

This paper describes an approach for using conventional photoresist materials to pattern structures with dimensions as small as 50 nm. This method, known as near field phase shift lithography (NFPSL), is an experimentally simple approach to nanofabrication that relies on ultraviolet exposure of a layer of resist while it is in conformal, atomic scale contact with such an elastomeric phase mask. This paper presents some representative structures produced with this method; it illustrates an example of its use in patterning the critical dimensions of organic transistors; and it outlines some new modeling results of the optics associated with this technique. © 2004 Elsevier B.V. All rights reserved.

Research Area(s)

  • Elastomer, Nanofabrication, Near field optics, Phase mask, Photolithography, Soft lithography

Bibliographic Note

Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to lbscholars@cityu.edu.hk.

Citation Format(s)

Nanopatterning with conformable phase masks. / Maria, Joana; Jeon, Seokwoo; Rogers, John A.

In: Journal of Photochemistry and Photobiology A: Chemistry, Vol. 166, No. 1-3, 12.08.2004, p. 149-154.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review