Nanoindentation and microtribological behavior of Fe-N/Ti-N multilayers with different thickness of Ti-N layers

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalNot applicablepeer-review

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Author(s)

  • X. C. Lu
  • B. Shi
  • J. Luo
  • X. Chang
  • Z. Tian
  • J. I. Mou

Detail(s)

Original languageEnglish
Pages (from-to)1144-1149
Journal / PublicationWear
Volume250-251
Issue numberPART 2
Publication statusPublished - Oct 2001
Externally publishedYes

Abstract

Fe-N/Ti-N multilayers with different thickness of Ti-N layers were deposited on Si(1 1 1) wafer by using magnetron-sputtering technique. For comparison, Fe-N and Ti-N single-layered films were prepared under the same condition. The microhardness and the reduced modulus of the multilayer were measured by using a nanoindentor with a diamond tip (Berkovich) in conjunction with an atomic force microscope (AFM). Microfriction and microscratch tests were performed by using a capacitance transducer with a conical diamond tip used in conjunction with the AFM. For applied normal force

Research Area(s)

  • Atomic force microscope, Microscratch, Multilayer, Nanoidentation

Citation Format(s)

Nanoindentation and microtribological behavior of Fe-N/Ti-N multilayers with different thickness of Ti-N layers. / Lu, X. C.; Shi, B.; Li, L. K Y; Luo, J.; Chang, X.; Tian, Z.; Mou, J. I.

In: Wear, Vol. 250-251, No. PART 2, 10.2001, p. 1144-1149.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalNot applicablepeer-review