Nanocrystalline (AlTiVCr)N Multi-Component Nitride Thin Films with Superior Mechanical Performance

Chuangshi Feng, Xiaobin Feng, Zhou Guan, Hongquan Song, Tianli Wang, Weibing Liao*, Yang Lu*, Fuxiang Zhang*

*Corresponding author for this work

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

10 Citations (Scopus)
61 Downloads (CityUHK Scholars)

Abstract

Multi-component nitride thin films usually show high hardness and good wear resistance due to the nanoscale structure and solid-solution strengthening effect. However, the state of N atoms in the thin film and its effects on the compressive strength is still unclear. In this work, (AlTiVCr)N multi-component nitride thin films with a face-centered cubic (FCC) structure prepared by the direct current magnetron sputtering method exhibit a superior strength of ~4.5 GPa and final fracture at a strain of ~5.0%. The excellent mechanical properties are attributed to the synergistic effects of the nanocrystalline structure, covalent bonding between N and metal atoms, and interstitial strengthening. Our results could provide an intensive understanding of the relationship between microstructure and mechanical performances for multi-component nitride thin films, which may promote their applications in micro- and nano-devices.
Original languageEnglish
Article number2722
JournalNanomaterials
Volume12
Issue number15
Online published8 Aug 2022
DOIs
Publication statusPublished - Aug 2022

Research Keywords

  • multi-component alloy
  • nitride thin film
  • nanocrystalline
  • in situ compressive test
  • HIGH-ENTROPY ALLOYS
  • COATINGS
  • TI
  • MICROSTRUCTURE
  • VANADIUM
  • OXIDES
  • XPS

Publisher's Copyright Statement

  • This full text is made available under CC-BY 4.0. https://creativecommons.org/licenses/by/4.0/

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