Multiple ion-focusing effects in plasma immersion ion implantation

X. B. Tian; Paul K. Chu

doi:10.1063/1.1520716

Multiple ion-focusing effects in plasma immersion ion implantation

X. B. Tian
, Paul K. Chu

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

16 Citations (Scopus)

Abstract

The multiple ion-focusing effects in plasma immersion ion implantation was discussed. A simple geometric model was presented for understanding the ion focusing effect and the ion dose uniformity. It was demonstrated that the ion focusing originates from plasma sheath convergence which depends on time and space. It was also found that the multiple ion focusing may occur at different local sites depending on the target shape and processing parameters.

Original language	English
Pages (from-to)	3744-3746
Journal	Applied Physics Letters
Volume	81
Issue number	20
DOIs	https://doi.org/10.1063/1.1520716
Publication status	Published - 11 Nov 2002

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title = "Multiple ion-focusing effects in plasma immersion ion implantation",

abstract = "The multiple ion-focusing effects in plasma immersion ion implantation was discussed. A simple geometric model was presented for understanding the ion focusing effect and the ion dose uniformity. It was demonstrated that the ion focusing originates from plasma sheath convergence which depends on time and space. It was also found that the multiple ion focusing may occur at different local sites depending on the target shape and processing parameters.",

author = "Tian, \{X. B.\} and Chu, \{Paul K.\}",

year = "2002",

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doi = "10.1063/1.1520716",

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journal = "Applied Physics Letters",

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TY - JOUR

T1 - Multiple ion-focusing effects in plasma immersion ion implantation

AU - Tian, X. B.

AU - Chu, Paul K.

PY - 2002/11/11

Y1 - 2002/11/11

N2 - The multiple ion-focusing effects in plasma immersion ion implantation was discussed. A simple geometric model was presented for understanding the ion focusing effect and the ion dose uniformity. It was demonstrated that the ion focusing originates from plasma sheath convergence which depends on time and space. It was also found that the multiple ion focusing may occur at different local sites depending on the target shape and processing parameters.

AB - The multiple ion-focusing effects in plasma immersion ion implantation was discussed. A simple geometric model was presented for understanding the ion focusing effect and the ion dose uniformity. It was demonstrated that the ion focusing originates from plasma sheath convergence which depends on time and space. It was also found that the multiple ion focusing may occur at different local sites depending on the target shape and processing parameters.

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UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-0037065104&origin=recordpage

U2 - 10.1063/1.1520716

DO - 10.1063/1.1520716

M3 - RGC 21 - Publication in refereed journal

SN - 0003-6951

VL - 81

SP - 3744

EP - 3746

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 20

ER -

Multiple ion-focusing effects in plasma immersion ion implantation

Abstract

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