Monte Carlo simulation of phase separation during thin-film codeposition

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

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Author(s)

Detail(s)

Original languageEnglish
Pages (from-to)1707-1715
Journal / PublicationJournal of Applied Physics
Volume74
Issue number3
Publication statusPublished - 1 Aug 1993
Externally publishedYes

Abstract

The results of Monte Carlo simulation of phase separation during binary film coevaporation are presented for a range of deposition conditions. The model employed assumes that phase separation occurs through surface interdiffusion during deposition, while the bulk of the film remains frozen. Simulations were performed on A-B alloy films having compositions of 10 and 50 vol % solute. For both film compositions, the lateral scale of the domains at the film surface evolves to a steady-state size during deposition. A power-law dependence of the steady-state domain size on the inverse deposition rate is obtained. Simulation microstructures at 50 vol % compare favorably with those obtained in a previous experimental study of phase separation during coevaporation of Al-Ge films of the same composition. Results of simulations performed at 10 vol % are compared with the predictions of a·theoretical model based on the above assumptions. The power-law exponent obtained from simulations at 10 vol % is different than that predicted by the theoretical model. The reasons for this difference are discussed.

Citation Format(s)

Monte Carlo simulation of phase separation during thin-film codeposition. / Adams, C. D.; Srolovitz, D. J.; Atzmon, M.
In: Journal of Applied Physics, Vol. 74, No. 3, 01.08.1993, p. 1707-1715.

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review