Modifying the microstructure and morphology of film surface layers by manipulating chemical vapor deposition reactor conditions

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

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Detail(s)

Original languageEnglish
Pages (from-to)4857-4865
Journal / PublicationJournal of Applied Physics
Volume89
Issue number9
Online published16 Apr 2001
Publication statusPublished - 1 May 2001
Externally publishedYes

Abstract

Two spatial dimension front tracking simulations have been performed to study the growth of polycrystalline, faceted films from randomly oriented nuclei. We present strategies to optimize the microstructure, morphology, and texture of thin films during chemical vapor deposition. In particular, we examine how changes in reactor conditions can be used to modify the mean grain size, surface roughness, crystallographic texture, and growth zones. Changing growth conditions once the target bulk film structure is established can be used to establish a thin surface region with much different structural characteristics. Analytical models are provided to aid in choosing the appropriate changes in reactor conditions and surface layer thickness to achieve optimal properties. © 2001 American Institute of Physics.