TY - JOUR
T1 - Modelling of semiconductor wafer fabrication systems by extended object-oriented Petri nets
AU - Liu, Huiran
AU - Fung, Richard Y. K.
AU - Jiang, Zhibin
PY - 2005/2/1
Y1 - 2005/2/1
N2 - In this paper, extended object-oriented Petri nets (EOPNs) are proposed for the effective modelling of semiconductor wafer fabrication systems (SWFSs). To cope with their complexity in terms of the re-entrant process route and the mixed production mode, a special type of transition called main-bus gate is introduced, which may lead each kind of product to undergo every re-entrant processing stage. In addition, the hierarchical approach is also applied to cope with the complexity. An etching area that processes 0.25 μm logic IC products is taken as an illustration to present the detailed modelling procedures by EOPNs, and the resulting model validates that the EOPNs may cope well with complex SWFSs modelling. © 2005 Taylor & Francis Ltd.
AB - In this paper, extended object-oriented Petri nets (EOPNs) are proposed for the effective modelling of semiconductor wafer fabrication systems (SWFSs). To cope with their complexity in terms of the re-entrant process route and the mixed production mode, a special type of transition called main-bus gate is introduced, which may lead each kind of product to undergo every re-entrant processing stage. In addition, the hierarchical approach is also applied to cope with the complexity. An etching area that processes 0.25 μm logic IC products is taken as an illustration to present the detailed modelling procedures by EOPNs, and the resulting model validates that the EOPNs may cope well with complex SWFSs modelling. © 2005 Taylor & Francis Ltd.
KW - Extended object-oriented Petri nets (EOPNs)
KW - Main-bus gate (MBG)
KW - Modelling
KW - Semiconductor wafer fabrication system (SWFS)
UR - http://www.scopus.com/inward/record.url?scp=27844530711&partnerID=8YFLogxK
UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-27844530711&origin=recordpage
U2 - 10.1080/0020754042000264563
DO - 10.1080/0020754042000264563
M3 - RGC 21 - Publication in refereed journal
SN - 0020-7543
VL - 43
SP - 471
EP - 495
JO - International Journal of Production Research
JF - International Journal of Production Research
IS - 3
ER -
