Modeling of the parasitic transistor-induced drain breakdown in MOSFET's
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
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Detail(s)
Original language | English |
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Pages (from-to) | 2190-2196 |
Journal / Publication | IEEE Transactions on Electron Devices |
Volume | 43 |
Issue number | 12 |
Publication status | Published - 1996 |
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Abstract
Parasitic bipolar transistor (PBT) induced break-down characteristics in MOSFET's are investigated and modeled with the aid of MINIMOS simulation. Formula for approximating the breakdown voltage is also developed. The proposed model agrees well with the MINIMOS simulation results, especially in the bias, temperature, and substrate resistance dependencies. According to the simulation and theoretical results, the break-down voltage for the PBT-induced breakdown can be increased by rising the temperature, increasing the channel length, and reducing the substrate resistance. © 1996 IEEE.
Citation Format(s)
Modeling of the parasitic transistor-induced drain breakdown in MOSFET's. / Wong, Hei.
In: IEEE Transactions on Electron Devices, Vol. 43, No. 12, 1996, p. 2190-2196.
In: IEEE Transactions on Electron Devices, Vol. 43, No. 12, 1996, p. 2190-2196.
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review