Modeling manufacturing yield and reliability

Taeho Kim; Way Kuo

doi:10.1109/66.806126

Author(s)

Taeho Kim
Way Kuo

Detail(s)

Original language	English
Pages (from-to)	485-492
Journal / Publication	IEEE Transactions on Semiconductor Manufacturing
Volume	12
Issue number	4
Publication status	Published - 1999
Externally published	Yes

Link(s)

DOI	DOI https://doi.org/10.1109/66.806126 Final Published version
	Check@CityULib
Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-0033342388&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(95b944a0-e029-40ff-9b2a-46f37bdecef2).html

Abstract

In this paper, we introduce the concept of reliability defect, present the time-dependent defect growth model during operations based on a defect-related gate oxide breakdown mechanism, and build the yield-reliability relation model. Discussions presented here can also be applicable to other device failures when different physics-of-failure mechanisms are found. Through the relation model, it is possible to find a minimum level of latent defect screening to assure the required level of reliability and predict reliability for new products when it is combined with a yield prediction model.

Citation Format(s)

[ RIS ] [ BibTeX ]

Modeling manufacturing yield and reliability. / Kim, Taeho; Kuo, Way.
In: IEEE Transactions on Semiconductor Manufacturing, Vol. 12, No. 4, 1999, p. 485-492.

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

Kim, T & Kuo, W 1999, 'Modeling manufacturing yield and reliability', IEEE Transactions on Semiconductor Manufacturing, vol. 12, no. 4, pp. 485-492. https://doi.org/10.1109/66.806126

Kim, T., & Kuo, W. (1999). Modeling manufacturing yield and reliability. IEEE Transactions on Semiconductor Manufacturing, 12(4), 485-492. https://doi.org/10.1109/66.806126

Kim T, Kuo W. Modeling manufacturing yield and reliability. IEEE Transactions on Semiconductor Manufacturing. 1999;12(4):485-492. doi: 10.1109/66.806126

Kim, Taeho ; Kuo, Way. / Modeling manufacturing yield and reliability. In: IEEE Transactions on Semiconductor Manufacturing. 1999 ; Vol. 12, No. 4. pp. 485-492.