Model-based clustering for integrated circuit yield enhancement
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Author(s)
Detail(s)
Original language | English |
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Pages (from-to) | 143-153 |
Journal / Publication | European Journal of Operational Research |
Volume | 178 |
Issue number | 1 |
Publication status | Published - 1 Apr 2007 |
Externally published | Yes |
Link(s)
Abstract
This paper studies the defect data analysis method for semiconductor yield enhancement. Given the defect locations on a wafer, the local defects generated from the assignable causes are classified from the global defects generated from the random causes by model-based clustering, and the clustering methods can identify the characteristics of local defect clusters. The information obtained from this method can facilitate process control, particularly, root-cause analysis. The global defects are modeled by the spatial non-homogeneous Poisson process, and the local defects are modeled by the bivariate normal distribution or by the principal curve. © 2006 Elsevier B.V. All rights reserved.
Research Area(s)
- Quality control, Stochastic processes
Citation Format(s)
Model-based clustering for integrated circuit yield enhancement. / Hwang, Jung Yoon; Kuo, Way.
In: European Journal of Operational Research, Vol. 178, No. 1, 01.04.2007, p. 143-153.
In: European Journal of Operational Research, Vol. 178, No. 1, 01.04.2007, p. 143-153.
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review