MmM5/Mg multi-layer hydrogen storage thin films prepared by dc magnetron sputtering

H. Wang; L. Z. Ouyang; C. H. Peng; M. Q. Zeng; C. Y. Chung; M. Zhu

doi:10.1016/j.jallcom.2003.09.019

Author(s)

H. Wang
L. Z. Ouyang
C. H. Peng
M. Q. Zeng
M. Zhu

Detail(s)

Original language	English
Journal / Publication	Journal of Alloys and Compounds
Volume	370
Issue number	1-2
Publication status	Published - 12 May 2004

Link(s)

DOI	DOI https://doi.org/10.1016/j.jallcom.2003.09.019 Final Published version
	Check@CityULib
Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-1942488944&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(5d56bcb5-2a27-45d9-92db-fa27f724f220).html

Abstract

MmNi_3.5(CoAlMn)_1.5/Mg (here Mm denoted for mischmetal) multi-layer thin films were deposited on (001) Si substrate by direct current (dc) magnetron sputtering with dual-target. X-ray diffraction (XRD) and scanning electron microscopy analysis revealed that the microstructure of the MmNi_3.5(CoAlMn)_1.5 layer is amorphous and/or nanocrystalline and that the microstructure of the Mg layer is fine grained crystalline with preferential orientation. Phase analysis of hydrogenated and dehydrogenated MmNi_3.5(CoAlMn)_1.5/Mg multi-layer thin films proved that an apparent absorption of hydrogen in the Mg layer occurs at temperatures higher than 200°C and that the hydrogen absorbed can be fully released at 250°C. © 2003 Elsevier B.V. All rights reserved.

Research Area(s)

Hydrogen storage alloys, Magnesium (Mg), Nanostructured materials, Thin films

Citation Format(s)

[ RIS ] [ BibTeX ]

MmM₅/Mg multi-layer hydrogen storage thin films prepared by dc magnetron sputtering. / Wang, H.; Ouyang, L. Z.; Peng, C. H.; Zeng, M. Q.; Chung, C. Y.; Zhu, M.

In: Journal of Alloys and Compounds, Vol. 370, No. 1-2, 12.05.2004.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal

Wang, H, Ouyang, LZ, Peng, CH, Zeng, MQ, Chung, CY & Zhu, M 2004, 'MmM₅/Mg multi-layer hydrogen storage thin films prepared by dc magnetron sputtering', Journal of Alloys and Compounds, vol. 370, no. 1-2. https://doi.org/10.1016/j.jallcom.2003.09.019

Wang, H., Ouyang, L. Z., Peng, C. H., Zeng, M. Q., Chung, C. Y., & Zhu, M. (2004). MmM₅/Mg multi-layer hydrogen storage thin films prepared by dc magnetron sputtering. Journal of Alloys and Compounds, 370(1-2). https://doi.org/10.1016/j.jallcom.2003.09.019

Wang H, Ouyang LZ, Peng CH, Zeng MQ, Chung CY, Zhu M. MmM₅/Mg multi-layer hydrogen storage thin films prepared by dc magnetron sputtering. Journal of Alloys and Compounds. 2004 May 12;370(1-2). https://doi.org/10.1016/j.jallcom.2003.09.019

Wang, H. ; Ouyang, L. Z. ; Peng, C. H. ; Zeng, M. Q. ; Chung, C. Y. ; Zhu, M. / MmM₅/Mg multi-layer hydrogen storage thin films prepared by dc magnetron sputtering. In: Journal of Alloys and Compounds. 2004 ; Vol. 370, No. 1-2.