Microstructure, surface morphology, and mechanical properties of nanocrystalline TiN/amorphous Si3N4 composite films synthesized by ion beam assisted deposition

C. H. Zhang; Z. J. Liu; K. Y. Li; Y. G. Shen; J. B. Luo

doi:10.1063/1.1638611

Microstructure, surface morphology, and mechanical properties of nanocrystalline TiN/amorphous Si₃N₄ composite films synthesized by ion beam assisted deposition

C. H. Zhang, Z. J. Liu, K. Y. Li, Y. G. Shen, J. B. Luo

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

53 Citations (Scopus)

Abstract

A study was conducted on the chemical composition, elemental bonding status, surface roughening kinetics, mechanical, and microstructural properties of Ti-Si-N thin films synthesized at room temperature by ion beam assisted deposition. These films were characterized ex situ in terms of their core-level electron bonding configuration and atomic concentations by XPS, their roughening kinetics by AFM with equal-time height-height correlation analysis, their hardness and elastic modulus by nanoindentation measurements, and their structural properties by TEM and XRD. Moreover, the microstructure of nanostructured Ti-Si-N films was also studied theoretically by a Monte Carlo simulation based on a modified Q-state model.

Original language	English
Pages (from-to)	1460-1467
Journal	Journal of Applied Physics
Volume	95
Issue number	3
DOIs	https://doi.org/10.1063/1.1638611
Publication status	Published - 1 Feb 2004

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@article{74e084035c54469cadcbad0f1f50f8a5,

title = "Microstructure, surface morphology, and mechanical properties of nanocrystalline TiN/amorphous Si3N4 composite films synthesized by ion beam assisted deposition",

abstract = "A study was conducted on the chemical composition, elemental bonding status, surface roughening kinetics, mechanical, and microstructural properties of Ti-Si-N thin films synthesized at room temperature by ion beam assisted deposition. These films were characterized ex situ in terms of their core-level electron bonding configuration and atomic concentations by XPS, their roughening kinetics by AFM with equal-time height-height correlation analysis, their hardness and elastic modulus by nanoindentation measurements, and their structural properties by TEM and XRD. Moreover, the microstructure of nanostructured Ti-Si-N films was also studied theoretically by a Monte Carlo simulation based on a modified Q-state model.",

author = "Zhang, {C. H.} and Liu, {Z. J.} and Li, {K. Y.} and Shen, {Y. G.} and Luo, {J. B.}",

year = "2004",

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volume = "95",

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journal = "Journal of Applied Physics",

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Microstructure, surface morphology, and mechanical properties of nanocrystalline TiN/amorphous Si₃N₄ composite films synthesized by ion beam assisted deposition. / Zhang, C. H.; Liu, Z. J.; Li, K. Y. et al.
In: Journal of Applied Physics, Vol. 95, No. 3, 01.02.2004, p. 1460-1467.

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

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T1 - Microstructure, surface morphology, and mechanical properties of nanocrystalline TiN/amorphous Si3N4 composite films synthesized by ion beam assisted deposition

AU - Zhang, C. H.

AU - Liu, Z. J.

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AU - Shen, Y. G.

AU - Luo, J. B.

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N2 - A study was conducted on the chemical composition, elemental bonding status, surface roughening kinetics, mechanical, and microstructural properties of Ti-Si-N thin films synthesized at room temperature by ion beam assisted deposition. These films were characterized ex situ in terms of their core-level electron bonding configuration and atomic concentations by XPS, their roughening kinetics by AFM with equal-time height-height correlation analysis, their hardness and elastic modulus by nanoindentation measurements, and their structural properties by TEM and XRD. Moreover, the microstructure of nanostructured Ti-Si-N films was also studied theoretically by a Monte Carlo simulation based on a modified Q-state model.

AB - A study was conducted on the chemical composition, elemental bonding status, surface roughening kinetics, mechanical, and microstructural properties of Ti-Si-N thin films synthesized at room temperature by ion beam assisted deposition. These films were characterized ex situ in terms of their core-level electron bonding configuration and atomic concentations by XPS, their roughening kinetics by AFM with equal-time height-height correlation analysis, their hardness and elastic modulus by nanoindentation measurements, and their structural properties by TEM and XRD. Moreover, the microstructure of nanostructured Ti-Si-N films was also studied theoretically by a Monte Carlo simulation based on a modified Q-state model.

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