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Microstructure of MmM5/Mg multi-layer films prepared by magnetron sputtering

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Abstract

    Microstructure of MmNi3.5(CoAlMn)1.5/Mg (here Mm denotes La-rich mischmetal) multi-layer hydrogen storage thin films prepared by direct current magnetron sputtering was investigated by cross-sectional transmission electron microscopy (XTEM). It was shown that the MmM5 layers are composed of two regions: an amorphous region with a thickness of ∼ 4 nm at the bottom of the layers and a randomly orientated nanocrystallite region on the top of the amorphous region and the Mg layers consist of typical columnar crystallite with their [0 0 1] direction nearly parallel to the growth direction. The mechanism for the formation of the above microstructure characteristics in the multi-layer thin films has been proposed. Based on the microstructure feature of the multi-layer films, mechanism for the apparent improvement of hydrogen absorption/desorption kinetics was discussed. © 2005 Elsevier B.V. All rights reserved.
    Original languageEnglish
    Pages (from-to)485-489
    JournalJournal of Alloys and Compounds
    Volume404-406
    Issue numberSPEC. ISS.
    DOIs
    Publication statusPublished - 8 Dec 2005

    UN SDGs

    This output contributes to the following UN Sustainable Development Goals (SDGs)

    1. SDG 7 - Affordable and Clean Energy
      SDG 7 Affordable and Clean Energy

    Research Keywords

    • Hydrogen storage alloys
    • Magnetron sputtering
    • Multi-layer films
    • Transmission electron microscopy (TEM)

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