Microstructure of MmM5/Mg multi-layer films prepared by magnetron sputtering

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal

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Author(s)

Detail(s)

Original languageEnglish
Pages (from-to)485-489
Journal / PublicationJournal of Alloys and Compounds
Volume404-406
Issue numberSPEC. ISS.
Publication statusPublished - 8 Dec 2005

Abstract

Microstructure of MmNi3.5(CoAlMn)1.5/Mg (here Mm denotes La-rich mischmetal) multi-layer hydrogen storage thin films prepared by direct current magnetron sputtering was investigated by cross-sectional transmission electron microscopy (XTEM). It was shown that the MmM5 layers are composed of two regions: an amorphous region with a thickness of ∼ 4 nm at the bottom of the layers and a randomly orientated nanocrystallite region on the top of the amorphous region and the Mg layers consist of typical columnar crystallite with their [0 0 1] direction nearly parallel to the growth direction. The mechanism for the formation of the above microstructure characteristics in the multi-layer thin films has been proposed. Based on the microstructure feature of the multi-layer films, mechanism for the apparent improvement of hydrogen absorption/desorption kinetics was discussed. © 2005 Elsevier B.V. All rights reserved.

Research Area(s)

  • Hydrogen storage alloys, Magnetron sputtering, Multi-layer films, Transmission electron microscopy (TEM)

Citation Format(s)

Microstructure of MmM5/Mg multi-layer films prepared by magnetron sputtering. / Ouyang, L. Z.; Wang, H.; Zhu, M.; Zou, J.; Chung, C. Y.

In: Journal of Alloys and Compounds, Vol. 404-406, No. SPEC. ISS., 08.12.2005, p. 485-489.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal