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Microstructure of GaN1-xBix

Z. Liliental-Weber*, R. Dos Reis, A.X. Levander, K.M. Yu, W. Walukiewicz, S.V. Novikov, C.T. Foxon

*Corresponding author for this work

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

Abstract

In this paper we describe detailed transmission electron microscopy studies of GaN1-xBix with 0.05 < x <0.18 grown by low-temperature molecular beam epitaxy under Ga-rich conditions. Microstructural transformation from columnar growth separated by thin amorphous areas in the films with lowest Bi content (5%) to pseudo-amorphous structure with crystalline grains embedded in the amorphous matrix in the samples with higher Bi content (13% to 18%) was observed. In addition, metallic Bi segregation occurred in the samples with the highest Bi concentration. An abrupt decrease in absorption edge energy is found in samples with higher Bi content. © 2012 TMS (outside the USA).
Original languageEnglish
Pages (from-to)26-32
JournalJournal of Electronic Materials
Volume42
Issue number1
DOIs
Publication statusPublished - Jan 2013
Externally publishedYes

Research Keywords

  • absorption
  • bandgap
  • GaNBi
  • highly mismatched semiconductors
  • Microstructure
  • TEM

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